Zorian S. Masnyj
Senior Process Engineer at
SPIE Involvement:
Author
Publications (5)

Proceedings Article | 27 December 2002
Proc. SPIE. 4889, 22nd Annual BACUS Symposium on Photomask Technology
KEYWORDS: Fabrication, Lithography, Etching, Quartz, Image processing, Chromium, Distortion, Photomasks, Critical dimension metrology, Overlay metrology

Proceedings Article | 27 December 2002
Proc. SPIE. 4889, 22nd Annual BACUS Symposium on Photomask Technology
KEYWORDS: Lithography, Reticles, Etching, Image processing, Chromium, Distortion, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Semiconducting wafers

Proceedings Article | 20 August 2001
Proc. SPIE. 4343, Emerging Lithographic Technologies V
KEYWORDS: Silicon, Scanning electron microscopy, Photomasks, Mask making, Critical dimension metrology, Line edge roughness, Photoresist processing, Semiconducting wafers, Charged-particle lithography, Chemically amplified resists

Proceedings Article | 21 July 2000
Proc. SPIE. 3997, Emerging Lithographic Technologies IV
KEYWORDS: Lithography, Deep ultraviolet, Manufacturing, Photomasks, Mask making, Critical dimension metrology, Line edge roughness, Thin film coatings, Photoresist processing, Semiconducting wafers

Proceedings Article | 30 December 1999
Proc. SPIE. 3873, 19th Annual Symposium on Photomask Technology
KEYWORDS: Multilayers, Reticles, Inspection, Chromium, Scanning electron microscopy, Printing, Silicon films, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography

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