Dr. Ana Armeanu
Technical Marketing Engineer at Mentor Graphics (Ireland) Ltd
SPIE Involvement:
Author
Publications (9)

Proceedings Article | 26 September 2019
Proc. SPIE. 11148, Photomask Technology 2019
KEYWORDS: Lithography, Phase shifting, Logic, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Source mask optimization, Optical proximity correction, SRAF, Nanoimprint lithography

Proceedings Article | 2 January 2019
Proc. SPIE. 10809, International Conference on Extreme Ultraviolet Lithography 2018
KEYWORDS: Lithography, Logic, Image processing, Photomasks, Extreme ultraviolet, Image enhancement, Source mask optimization, SRAF, Tantalum, Resolution enhancement technologies

Proceedings Article | 24 March 2017
Proc. SPIE. 10147, Optical Microlithography XXX
KEYWORDS: Finite-difference time-domain method, Lithographic illumination, Cadmium, Reflection, Image processing, Silicon, 3D modeling, Printing, Solids, Process control, Field effect transistors, Computational lithography, Optical proximity correction, Critical dimension metrology, Semiconducting wafers, Anisotropy

SPIE Journal Paper | 27 April 2016
JM3 Vol. 15 Issue 02
KEYWORDS: Photomasks, Calibration, Optical proximity correction, Critical dimension metrology, Electroluminescence, Wafer-level optics, Semiconducting wafers, Data modeling, 3D modeling, Scanning electron microscopy

Proceedings Article | 23 October 2015
Proc. SPIE. 9635, Photomask Technology 2015
KEYWORDS: Wafer-level optics, Neck, Data modeling, Calibration, Photomasks, Optical proximity correction, Critical dimension metrology, Photoresist processing, Semiconducting wafers, Process modeling

Showing 5 of 9 publications
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