Dr. Ana Armeanu
Technical Marketing Engineer at Mentor Graphics (Ireland) Ltd
SPIE Involvement:
Author
Publications (8)

PROCEEDINGS ARTICLE | October 12, 2018
Proc. SPIE. 10809, International Conference on Extreme Ultraviolet Lithography 2018
KEYWORDS: Lithography, Logic, Image processing, Photomasks, Extreme ultraviolet, Image enhancement, Source mask optimization, SRAF, Tantalum, Resolution enhancement technologies

PROCEEDINGS ARTICLE | March 24, 2017
Proc. SPIE. 10147, Optical Microlithography XXX
KEYWORDS: Finite-difference time-domain method, Lithographic illumination, Cadmium, Reflection, Image processing, Silicon, 3D modeling, Printing, Solids, Process control, Field effect transistors, Computational lithography, Optical proximity correction, Critical dimension metrology, Semiconducting wafers, Anisotropy

SPIE Journal Paper | April 27, 2016
JM3 Vol. 15 Issue 02
KEYWORDS: Photomasks, Calibration, Optical proximity correction, Critical dimension metrology, Electroluminescence, Wafer-level optics, Semiconducting wafers, Data modeling, 3D modeling, Scanning electron microscopy

PROCEEDINGS ARTICLE | October 23, 2015
Proc. SPIE. 9635, Photomask Technology 2015
KEYWORDS: Wafer-level optics, Neck, Data modeling, Calibration, Photomasks, Optical proximity correction, Critical dimension metrology, Photoresist processing, Semiconducting wafers, Process modeling

PROCEEDINGS ARTICLE | October 17, 2014
Proc. SPIE. 9231, 30th European Mask and Lithography Conference
KEYWORDS: Refractive index, Metrology, Data modeling, Calibration, Manufacturing, 3D modeling, Photoresist materials, Photomasks, Optical proximity correction, Semiconducting wafers

PROCEEDINGS ARTICLE | October 1, 2013
Proc. SPIE. 8880, Photomask Technology 2013
KEYWORDS: Data modeling, Modulation, Calibration, Silicon, 3D modeling, Scanning electron microscopy, Photomasks, Optical proximity correction, Semiconducting wafers, Active optics

Showing 5 of 8 publications
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