Dr. Ben Zhang
at Cornell Univ
SPIE Involvement:
Author
Publications (3)

PROCEEDINGS ARTICLE | May 27, 2015
Proc. SPIE. 9422, Extreme Ultraviolet (EUV) Lithography VI
KEYWORDS: Oxides, Optical lithography, Deep ultraviolet, Nanoparticles, Metals, Particles, Photoresist materials, Extreme ultraviolet, Extreme ultraviolet lithography, Zirconium dioxide

PROCEEDINGS ARTICLE | May 27, 2015
Proc. SPIE. 9422, Extreme Ultraviolet (EUV) Lithography VI
KEYWORDS: Oxides, Optical lithography, Nanoparticles, Metals, Photoresist materials, Extreme ultraviolet, Extreme ultraviolet lithography, Line edge roughness, Zirconium dioxide, Photoresist developing

PROCEEDINGS ARTICLE | March 20, 2015
Proc. SPIE. 9425, Advances in Patterning Materials and Processes XXXII
KEYWORDS: Oxides, Electron beam lithography, Magnesium, Nanoparticles, Particles, Photoresist materials, Extreme ultraviolet lithography, Sodium, Hafnium, Absorption

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