Mr. Benoit L'Herron
Thin films metrology development at IBM Corp
SPIE Involvement:
Author
Publications (2)

PROCEEDINGS ARTICLE | March 30, 2016
Proc. SPIE. 9778, Metrology, Inspection, and Process Control for Microlithography XXX
KEYWORDS: Metrology, Optical lithography, Diffractive optical elements, Etching, Transmission electron microscopy, Scatterometry, Process control, Critical dimension metrology, Reactive ion etching, Semiconducting wafers

PROCEEDINGS ARTICLE | March 19, 2015
Proc. SPIE. 9424, Metrology, Inspection, and Process Control for Microlithography XXIX
KEYWORDS: Metrology, X-rays, Copper, Transmission electron microscopy, Scatterometry, Process control, Critical dimension metrology, Semiconducting wafers, X-ray fluorescence spectroscopy, Chemical mechanical planarization

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