Cathy Wang
at ASML Taiwan Ltd
SPIE Involvement:
Author
Publications (13)

PROCEEDINGS ARTICLE | March 20, 2018
Proc. SPIE. 10587, Optical Microlithography XXXI
KEYWORDS: Reticles, Deep ultraviolet, Scanners, Manufacturing, Distortion, Pellicles, Extreme ultraviolet, Extreme ultraviolet lithography, Semiconducting wafers, Overlay metrology

PROCEEDINGS ARTICLE | March 13, 2018
Proc. SPIE. 10585, Metrology, Inspection, and Process Control for Microlithography XXXII
KEYWORDS: Metrology, Polarization, Etching, Physics, Scanning electron microscopy, Monte Carlo methods, Signal processing, Semiconductor manufacturing, Semiconducting wafers, Overlay metrology

PROCEEDINGS ARTICLE | March 28, 2017
Proc. SPIE. 10145, Metrology, Inspection, and Process Control for Microlithography XXXI
KEYWORDS: Target detection, Wafer-level optics, Thin films, Diffraction, Metrology, Detection and tracking algorithms, Polarization, Image quality, Solids, Process control, Semiconducting wafers, Defense systems, Overlay metrology, Diffraction gratings

PROCEEDINGS ARTICLE | March 19, 2015
Proc. SPIE. 9424, Metrology, Inspection, and Process Control for Microlithography XXIX
KEYWORDS: Target detection, Metrology, Etching, Scanners, Time metrology, Process control, Target acquisition, Semiconducting wafers, Overlay metrology, Back end of line

PROCEEDINGS ARTICLE | April 10, 2013
Proc. SPIE. 8681, Metrology, Inspection, and Process Control for Microlithography XXVII
KEYWORDS: Diffraction, Metrology, Scanners, Time metrology, High volume manufacturing, Thin film coatings, Semiconducting wafers, Overlay metrology, Tin, Chemical mechanical planarization

PROCEEDINGS ARTICLE | April 3, 2012
Proc. SPIE. 8324, Metrology, Inspection, and Process Control for Microlithography XXVI
KEYWORDS: Lithography, Diffraction, Reticles, Metrology, Physics, Scatterometry, Semiconducting wafers, Overlay metrology, Standards development, Diffraction gratings

Showing 5 of 13 publications
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