Dr. Chiew-Seng Koay
at IBM
SPIE Involvement:
Author
Publications (43)

Proceedings Article | 28 March 2017
Proc. SPIE. 10145, Metrology, Inspection, and Process Control for Microlithography XXXI
KEYWORDS: Near infrared, Lithography, Optical filters, Metrology, Calibration, Scanners, Semiconducting wafers, Overlay metrology

Proceedings Article | 8 March 2016
Proc. SPIE. 9778, Metrology, Inspection, and Process Control for Microlithography XXX
KEYWORDS: Optical filters, Metrology, Optical lithography, Sensors, Image segmentation, Inspection, Reflectivity, Scatterometry, Solids, Semiconducting wafers, Overlay metrology, Back end of line, Front end of line

Proceedings Article | 13 March 2015
Proc. SPIE. 9422, Extreme Ultraviolet (EUV) Lithography VI
KEYWORDS: Carbon, Lithography, Optical lithography, Inspection, Signal processing, Wafer inspection, Extreme ultraviolet, Extreme ultraviolet lithography, Critical dimension metrology, Semiconducting wafers

Proceedings Article | 29 March 2013
Proc. SPIE. 8682, Advances in Resist Materials and Processing Technology XXX
KEYWORDS: Lithography, Etching, Scanning electron microscopy, Line width roughness, Double patterning technology, Chemical reactions, Critical dimension metrology, Line edge roughness, Photoresist processing, Semiconducting wafers

Proceedings Article | 20 March 2012
Proc. SPIE. 8325, Advances in Resist Materials and Processing Technology XXIX
KEYWORDS: Roads, Etching, Polymers, Image processing, Scanning electron microscopy, Optical proximity correction, Reactive ion etching, Neodymium, Semiconducting wafers, Photoresist developing

Proceedings Article | 14 March 2012
Proc. SPIE. 8322, Extreme Ultraviolet (EUV) Lithography III
KEYWORDS: Lithography, Optical lithography, Metals, Manufacturing, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Immersion lithography, Semiconducting wafers, Overlay metrology

Showing 5 of 43 publications
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