Dan Zhang
at Mentor a Siemens Business
SPIE Involvement:
Author
Publications (2)

PROCEEDINGS ARTICLE | March 20, 2018
Proc. SPIE. 10587, Optical Microlithography XXXI
KEYWORDS: Lithography, Genetic algorithms, Printing, Photomasks, Source mask optimization, Optical proximity correction, SRAF, Critical dimension metrology, Optimization (mathematics), Semiconducting wafers

PROCEEDINGS ARTICLE | October 3, 2016
Proc. SPIE. 9985, Photomask Technology 2016
KEYWORDS: Lithography, Metals, Image processing, Manufacturing, Data processing, Process control, Photomasks, Cadmium sulfide, Optical proximity correction, Semiconducting wafers

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