Dr. David Fuard
at LTM CNRS
SPIE Involvement:
Author
Publications (7)

PROCEEDINGS ARTICLE | May 13, 2013
Proc. SPIE. 8789, Modeling Aspects in Optical Metrology IV
KEYWORDS: Lithography, Diffraction, Refractive index, Metrology, Data modeling, Scatterometry, Inverse problems, Process control, Neural networks, Optimization (mathematics)

PROCEEDINGS ARTICLE | April 2, 2010
Proc. SPIE. 7638, Metrology, Inspection, and Process Control for Microlithography XXIV
KEYWORDS: Metrology, Optical lithography, Data modeling, Calibration, Inspection, Atomic force microscopy, Scanning electron microscopy, Process control, Optical proximity correction, Current controlled current source

PROCEEDINGS ARTICLE | March 24, 2009
Proc. SPIE. 7272, Metrology, Inspection, and Process Control for Microlithography XXIII
KEYWORDS: Thin films, Refractive index, Metrology, Optical lithography, Polymers, Spectroscopy, Inspection, Process control, Polymer thin films, Current controlled current source

PROCEEDINGS ARTICLE | March 23, 2009
Proc. SPIE. 7272, Metrology, Inspection, and Process Control for Microlithography XXIII
KEYWORDS: Lithography, Data modeling, Calibration, Reliability, Scanning electron microscopy, Optical proximity correction, Critical dimension metrology, Optics manufacturing, Fuzzy logic, Mahalanobis distance

PROCEEDINGS ARTICLE | May 28, 2004
Proc. SPIE. 5377, Optical Microlithography XVII
KEYWORDS: Lithography, Lithographic illumination, Data modeling, Photomasks, Optical proximity correction, Critical dimension metrology, Photoresist processing, Binary data, 193nm lithography, Phase shifts

PROCEEDINGS ARTICLE | June 26, 2003
Proc. SPIE. 5040, Optical Microlithography XVI
KEYWORDS: Lithography, Diamond, Data modeling, Diffusion, Solids, Finite element methods, Photomasks, Critical dimension metrology, Performance modeling, Ranging

Showing 5 of 7 publications
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