Prof. John T. Fourkas Profile

Prof. John T. Fourkas

Millard Alexander Professor of Chemistry at Univ of Maryland College Park

SPIE Involvement:

Conference Program Committee | Author

Websites:

Personal Website

Profile Summary

My research focus is on the use of ultrafast lasers and nonlinear optical techniques to probe, control and fashion condensed matter. Some of our current areas of interest include multiphoton fabrication of functional micro and nanodevices, development of new nonlinear optical microscopies, the structure and dynamics of confined liquids, characterization of absorptive nonlinearities, and controlling the behavior of cells via nanotopography.

ORCID 0000-0002-4522-9584

Publications (18)

Proceedings Article | 13 March 2024 Presentation

Presentation

Single molecule orientational microscopy: an accurate measurement?

Muneesh Maheshwari, Kishalay Mahato, John Fourkas, J. Alexander Liddle, Henri Lezec, Dhruv Fomra

Proceedings Volume PC12849, PC1284903 (2024) https://doi.org/10.1117/12.3001259

KEYWORDS: Molecules, Measurement uncertainty, Point spread functions, Fluorophores, Image analysis, Background noise, Proteins, Polarization density, Physical phenomena, Photonic nanostructures

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Proceedings Article | 30 June 2022 Open Access

Open Access

Paper

Freely available optics lectures and a proposal for universal free online education

Rick Trebino, John Fourkas

Proceedings Volume 12297, 122970F (2022) https://doi.org/10.1117/12.2635516

KEYWORDS: Physics, Video, Polishing, Photonics, Internet, Education and training, Optics education, Head, Chemistry, Chemical elements

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Proceedings Article | 26 March 2019 Paper

Paper

Oxygen effects in thin films for high-resolution , 3-color lithography

Sandra Gutierrez Razo, Nikolaos Liaros, Adam Pranda, Gottlieb Oehrlein, John Fourkas, John Petersen

Proceedings Volume 10958, 1095814 (2019) https://doi.org/10.1117/12.2516544

KEYWORDS: Oxygen, Thin films, Photoresist materials, Polymerization, Lithography, Optical lithography, Glasses, Bioalcohols, Visible radiation, Water

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Proceedings Article | 19 March 2018 Paper

Paper

Benchmarking 3-color photoresists for multiphoton absorption lithography

Nikolaos Liaros, Sandra Gutierrez Razo, Zuleykhan Tomova, John Petersen, John Fourkas

Proceedings Volume 10584, 1058417 (2018) https://doi.org/10.1117/12.2299318

KEYWORDS: Lithography, Photoresist materials, Molecules, Polymerization, Multiphoton lithography, Visible radiation, Chemistry, Continuous wave operation, Super resolution

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Proceedings Article | 19 March 2018 Paper

Paper

The state of the art in multicolor visible photolithography

Nikolaos Liaros, Zuleykhan Tomova, Sandra Gutierrez Razo, Samuel Cohen, John Fourkas, Steven Wolf, Matthew Thum, Daniel Falvey, Hannah Ogden, Amy Mullin, Adam Pranda, Gottlieb Oehrlein, John Petersen

Proceedings Volume 10584, 1058407 (2018) https://doi.org/10.1117/12.2297653

KEYWORDS: Photoresist materials, Optical lithography, Lithography, Thin films, Absorption, Molecules, Microscopy, Stimulated emission depletion microscopy, Etching, Point spread functions

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Proceedings Article | 19 March 2018 Paper

Paper

In situ polymerization threshold detection of 3-color systems and a study of the time dependence

Hannah Ogden, Amy Mullin, Sandra Gutierrez Razo, Nikolaos Liaros, John Fourkas, John Peterson

Proceedings Volume 10584, 1058419 (2018) https://doi.org/10.1117/12.2302807

KEYWORDS: Polymerization, Lithography, Diffraction, Polymers, In situ metrology, Molecules, Photoresist materials, Laser beam diagnostics, Optical parametric oscillators, Beam splitters

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Proceedings Article | 19 March 2018 Paper

Paper

Thin films for high-resolution, 3-color lithography

Sandra Gutierrez Razo, Adam Pranda, Nikolaos Liaros, Samuel Cohen, John Fourkas, Gottlieb Oehrlein, Hannah Ogden, Amy Mullin, Steven Wolf, Daniel Falvey, John Petersen

Proceedings Volume 10584, 1058418 (2018) https://doi.org/10.1117/12.2299681

KEYWORDS: Visible radiation, Thin films, Lithography, Semiconducting wafers, Photoresist materials, Silicon, Etching, Optical lithography, Resistance, Plasma

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Proceedings Article | 23 February 2018 Presentation + Paper

Presentation + Paper

Coupling single defects in 2D semiconductor to a silver nanowire

Tao Cai, Subhojit Dutta, Shahriar Aghaeimeibodi, Zhili Yang, Sanghee Nah, John Fourkas, Edo Waks

Proceedings Volume 10534, 105340F (2018) https://doi.org/10.1117/12.2285431

KEYWORDS: Nanowires, Silver, Plasmonics, Semiconductors, Surface plasmons, Surface plasmon polaritons, Polarization, Continuous wave operation, Excitons

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Proceedings Article | 18 March 2015 Paper

Paper

Multicolor, visible-light nanolithography

John Fourkas, Zuleykhan Tomova

Proceedings Volume 9426, 94260C (2015) https://doi.org/10.1117/12.2087107

KEYWORDS: Optical lithography, Photoresist materials, Lithography, Molecules, Chemistry, Absorption, Nanolithography, Visible radiation, Diffraction, Semiconductors

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Proceedings Article | 16 March 2015 Paper

Paper

Resolution enhancement through three color photolithography

Zuleykhan Tomova, John Fourkas

Proceedings Volume 9353, 935312 (2015) https://doi.org/10.1117/12.2084451

KEYWORDS: Polymerization, Molecules, Optical lithography, Photoresist materials, Absorption, Molecular lasers, Lithography, Resolution enhancement technologies, Visible radiation, Photons

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Proceedings Article | 6 March 2014 Paper

Paper

Creation of multimaterial micro- and nanostructures through aqueous-based fabrication, manipulation, and immobilization

John Fourkas, Farah Dawood, Sijia Qin, Linjie Li, Sanghee Nah, Chad Ropp, Zachary Cummins, Benjamin Shapiro, Edo Waks

Proceedings Volume 8970, 89700M (2014) https://doi.org/10.1117/12.2042545

KEYWORDS: Photoresist materials, Optical tweezers, Nanostructures, Absorption, Photopolymerization, Polymers, Nanolithography, Polymerization, Glasses, Water

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Proceedings Article | 29 March 2013 Paper

Paper

Probing light-matter interactions at the nanoscale with a deterministically positioned single quantum dot

Chad Ropp, Zachary Cummins, Roland Probst, Sijia Qin, John Fourkas, Benjamin Shapiro, Edo Waks

Proceedings Volume 8634, 86340H (2013) https://doi.org/10.1117/12.2004820

KEYWORDS: Microfluidics, Quantum dots, Particles, Glasses, Electrodes, Diffraction, Light-matter interactions, Microfluidic imaging, Chemistry, Near field optics

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Proceedings Article | 8 February 2012 Paper

Paper

Elucidating the kinetics and mechanism of RAPID lithography

Michael Stocker, John Fourkas

Proceedings Volume 8249, 824902 (2012) https://doi.org/10.1117/12.912944

KEYWORDS: Photoresist materials, Polymerization, Absorption, Lithography, Molecules, Photons, Bragg cells, Photochemistry, Microscopes, LabVIEW

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Proceedings Article | 30 August 2010 Paper

Paper

Controlled placement of single photon sources for quantum integration

Edo Waks, Chad Ropp, Roland Probst, Zach Cummins, Rakesh Kumar, Andrew Berglund, Srinivasa Raghavan, John Fourkas, Benjamin Shapiro

Proceedings Volume 7815, 781509 (2010) https://doi.org/10.1117/12.859864

KEYWORDS: Quantum dots, Particles, Cameras, Microfluidics, Single photon, Nanophotonics, Electrodes, Detection and tracking algorithms, Atmospheric particles, Microfluidic imaging

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Proceedings Article | 7 March 2007 Paper

Paper

Soft-lithographic replication of 3D polymeric microstructures created with MAP

Christopher LaFratta, Linjie Li, John Fourkas

Proceedings Volume 6462, 646210 (2007) https://doi.org/10.1117/12.704607

KEYWORDS: 3D microstructuring, Absorption, Bridges, Polymers, Fabrication, Lithography, Polymerization, Semiconducting wafers, Optical lithography, Photons

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Proceedings Article | 27 October 2003 Paper

Paper

Novel ZnO nanostructures

Jingyu Lao, Jianyu Huang, Debasish Banerjee, Sung-Ho Jo, Dezhi Wang, Jianguo Wen, Diane Steeves, Brian Kimball, W. Porter, Richard Farrer, Tommaso Baldacchini, John Fourkas, Zhifeng Ren

Proceedings Volume 5219, (2003) https://doi.org/10.1117/12.504821

KEYWORDS: Zinc oxide, Nanostructures, Gold, Nanoparticles, Silicon, Thin films, Scanning electron microscopy, Sapphire, Nanowires, Nanorods

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Proceedings Article | 1 April 2002 Paper

Paper

Multiphoton photopolymerization with a Ti:sapphire oscillator

Tommaso Baldacchini, Huzhen Chen, Richard Farrer, Michael Previte, Joel Moser, Michael Naughton, John Fourkas

Proceedings Volume 4633, (2002) https://doi.org/10.1117/12.461373

KEYWORDS: Photopolymerization, Oscillators, Lithium, Microfabrication, Biomedical optics, Ultrafast phenomena, Free electron lasers, Ultraviolet radiation, Picosecond phenomena, Sapphire lasers

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Proceedings Article | 17 June 1994 Paper

Paper

Mechanical mechanism for the ultrafast perturbation of electronic states in solution

Mark Berg, John Fourkas, Andrea Benigno

Proceedings Volume 2124, (1994) https://doi.org/10.1117/12.178117

KEYWORDS: Liquids, Glasses, Temperature metrology, Absorption, Hole burning spectroscopy, Picosecond phenomena, Solids, Phonons, Ultrafast phenomena, Systems modeling

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Showing 5 of 18 publications

Conference Committee Involvement (13)

Laser 3D Manufacturing XII

25 January 2025 | San Francisco, United States

Laser 3D Manufacturing XI

30 January 2024 | San Francisco, California, United States

Laser 3D Manufacturing X

31 January 2023 | San Francisco, California, United States

Laser 3D Manufacturing IX

25 January 2022 | San Francisco, California, United States

Laser 3D Manufacturing VIII

6 March 2021 | Online Only, California, United States

Showing 5 of 13 Conference Committees

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