Jae-Wuk Ju
Principal Engineer at SK Hynix Inc
SPIE Involvement:
Author
Publications (5)

PROCEEDINGS ARTICLE | March 13, 2018
Proc. SPIE. 10585, Metrology, Inspection, and Process Control for Microlithography XXXII
KEYWORDS: Metrology, Computational modeling, Sensors, Manufacturing, Inspection, Computing systems, Process control, Optical alignment, Semiconducting wafers, Overlay metrology

PROCEEDINGS ARTICLE | March 13, 2018
Proc. SPIE. 10585, Metrology, Inspection, and Process Control for Microlithography XXXII
KEYWORDS: Lithography, Metrology, Etching, Manufacturing, Inspection, Control systems, Critical dimension metrology, Semiconducting wafers, Overlay metrology

PROCEEDINGS ARTICLE | March 18, 2016
Proc. SPIE. 9778, Metrology, Inspection, and Process Control for Microlithography XXX
KEYWORDS: Metrology, Optical lithography, Data modeling, Image processing, Scanners, Control systems, Zernike polynomials, Process control, High volume manufacturing, Semiconducting wafers, Yield improvement, Overlay metrology

PROCEEDINGS ARTICLE | March 8, 2016
Proc. SPIE. 9778, Metrology, Inspection, and Process Control for Microlithography XXX
KEYWORDS: Environmental monitoring, Contamination, Databases, Metals, Scanners, Reflectivity, Data processing, High volume manufacturing, Semiconducting wafers, Overlay metrology

PROCEEDINGS ARTICLE | March 19, 2015
Proc. SPIE. 9424, Metrology, Inspection, and Process Control for Microlithography XXIX
KEYWORDS: Mathematical modeling, Data modeling, Scanners, Zernike polynomials, Process control, Feedback control, Semiconducting wafers, Statistical modeling, Performance modeling, Overlay metrology

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