Jae-Wuk Ju
Principal Engineer at SK Hynix Inc
SPIE Involvement:
Author
Publications (8)

Proceedings Article | 20 March 2020
Proc. SPIE. 11325, Metrology, Inspection, and Process Control for Microlithography XXXIV
KEYWORDS: Metrology, Spatial frequencies, Etching, Scanners, Inspection, High volume manufacturing, Feedback loops, Semiconducting wafers, Overlay metrology

Proceedings Article | 20 March 2019
Proc. SPIE. 10961, Optical Microlithography XXXII
KEYWORDS: Lithography, Metrology, Data modeling, Sensors, Calibration, Scanners, High volume manufacturing, Optical alignment, Semiconducting wafers, Overlay metrology

Proceedings Article | 20 March 2019
Proc. SPIE. 10963, Advanced Etch Technology for Nanopatterning VIII
KEYWORDS: Lithography, Metrology, Optical lithography, Etching, Scanners, Process control, Critical dimension metrology, Semiconducting wafers, Overlay metrology, Plasma

Proceedings Article | 13 March 2018
Proc. SPIE. 10585, Metrology, Inspection, and Process Control for Microlithography XXXII
KEYWORDS: Metrology, Computational modeling, Sensors, Manufacturing, Inspection, Computing systems, Process control, Optical alignment, Semiconducting wafers, Overlay metrology

Proceedings Article | 13 March 2018
Proc. SPIE. 10585, Metrology, Inspection, and Process Control for Microlithography XXXII
KEYWORDS: Lithography, Metrology, Etching, Manufacturing, Inspection, Control systems, Critical dimension metrology, Semiconducting wafers, Overlay metrology

Showing 5 of 8 publications
SIGN IN TO:
  • View contact details

UPDATE YOUR PROFILE
Is this your profile? Update it now.
Don’t have a profile and want one?

Advertisement
Advertisement
Back to Top