James Guerrero
Field Applications Engineer
SPIE Involvement:
Publications (5)

Proceedings Article | 20 March 2019 Presentation + Paper
Ao Chen, Kar Kit Koh, Yee Mei Foong, Bradley Morgenfeld, Jun Chen, Sandra Lee, Xi Chen, Hesham Omar, Mu Feng, ChangAn Wang, Keith Gronlund, Jun Lang, James Guerrero, Yiqiong Zhao
Proceedings Volume 10961, 109610F (2019) https://doi.org/10.1117/12.2514784
KEYWORDS: Diffusion, SRAF, Photoresist processing, Calibration, Photo decomposable quencher, Semiconducting wafers, Process modeling, Performance modeling, 3D modeling, Error analysis

Proceedings Article | 22 March 2018 Paper
Qian Zhao, Lei Wang, Jazer Wang, ChangAn Wang, Hong-Fei Shi, James Guerrero, Mu Feng, Qiang Zhang, Jiao Liang, Yunbo Guo, Chen Zhang, Tom Wallow, David Rio, Lester Wang, Alvin Wang, Jen-Shiang Wang, Keith Gronlund, Jun Lang, Kar Kit Koh, Dong Qing Zhang, Hongxin Zhang, Subramanian Krishnamurthy, Ray Fei, Chiawen Lin, Wei Fang, Fei Wang
Proceedings Volume 10585, 105852Q (2018) https://doi.org/10.1117/12.2299971
KEYWORDS: Metrology, Data modeling, Calibration, Optical proximity correction, Scanning electron microscopy, Image processing, Time metrology, Critical dimension metrology, Semiconducting wafers, Error analysis

Proceedings Article | 15 March 2016 Paper
Ao Chen, Yee Mei Foong, Jessy Schramm, Liang Ji, Stephen Hsu, James Guerrero, Xiaoyang Li, Joe Shaw, Joe Wang
Proceedings Volume 9780, 97801A (2016) https://doi.org/10.1117/12.2219864
KEYWORDS: Source mask optimization, Lithography, Metals, Photomasks, Etching, Resolution enhancement technologies, Logic, Lithographic illumination, Optical lithography, Computational lithography, Critical dimension metrology, Sensors, Photovoltaics, Optical proximity correction, Electroluminescence

Proceedings Article | 10 May 2005 Paper
Proceedings Volume 5752, (2005) https://doi.org/10.1117/12.599282
KEYWORDS: Optical lithography, Monochromatic aberrations, Semiconducting wafers, Lithographic illumination, Metals, Critical dimension metrology, Yield improvement, Interferometers, Error analysis, Lithography

Proceedings Article | 14 September 2001 Paper
Proceedings Volume 4346, (2001) https://doi.org/10.1117/12.435701
KEYWORDS: Overlay metrology, Reticles, Imaging systems, Lithography, Interferometers, Wavefronts, Systems modeling, Semiconducting wafers, Personal protective equipment, Optical lithography

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