James Guerrero
Field Applications Engineer
SPIE Involvement:
Author
Publications (5)

Proceedings Article | 20 March 2019 Presentation + Paper
Proc. SPIE. 10961, Optical Microlithography XXXII
KEYWORDS: Diffusion, SRAF, Photoresist processing, Calibration, Photo decomposable quencher, Semiconducting wafers, Process modeling, Performance modeling, 3D modeling, Error analysis

Proceedings Article | 22 March 2018 Paper
Proc. SPIE. 10585, Metrology, Inspection, and Process Control for Microlithography XXXII
KEYWORDS: Metrology, Data modeling, Calibration, Optical proximity correction, Scanning electron microscopy, Image processing, Time metrology, Critical dimension metrology, Semiconducting wafers, Error analysis

Proceedings Article | 15 March 2016 Paper
Proc. SPIE. 9780, Optical Microlithography XXIX
KEYWORDS: Source mask optimization, Lithography, Metals, Photomasks, Etching, Resolution enhancement technologies, Logic, Lithographic illumination, Optical lithography, Computational lithography, Critical dimension metrology, Sensors, Photovoltaics, Optical proximity correction, Electroluminescence

Proceedings Article | 10 May 2005 Paper
Proc. SPIE. 5752, Metrology, Inspection, and Process Control for Microlithography XIX
KEYWORDS: Optical lithography, Monochromatic aberrations, Semiconducting wafers, Lithographic illumination, Metals, Critical dimension metrology, Yield improvement, Interferometers, Error analysis, Lithography

Proceedings Article | 14 September 2001 Paper
Proc. SPIE. 4346, Optical Microlithography XIV
KEYWORDS: Overlay metrology, Reticles, Imaging systems, Lithography, Interferometers, Wavefronts, Systems modeling, Semiconducting wafers, Personal protective equipment, Optical lithography

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