Dr. Zhengqing John Qi
Publications (20)

Proceedings Article | 27 March 2017
Proc. SPIE. 10143, Extreme Ultraviolet (EUV) Lithography VIII
KEYWORDS: Reflectors, Statistical analysis, Data modeling, Silicon, Reflectivity, Surface roughness, Monte Carlo methods, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Optical proximity correction, Molybdenum, Electromagnetic theory, Scanning tunneling microscopy

Proceedings Article | 24 March 2017
Proc. SPIE. 10143, Extreme Ultraviolet (EUV) Lithography VIII
KEYWORDS: Lithography, Metrology, Scanning electron microscopy, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Critical dimension metrology, Stochastic processes

Proceedings Article | 4 October 2016
Proc. SPIE. 9985, Photomask Technology 2016
KEYWORDS: Multilayers, Finite-difference time-domain method, Coating, Printing, Photomasks, Extreme ultraviolet, Aluminum, Critical dimension metrology, Semiconducting wafers, Phase shifts

Proceedings Article | 10 May 2016
Proc. SPIE. 9984, Photomask Japan 2016: XXIII Symposium on Photomask and Next-Generation Lithography Mask Technology
KEYWORDS: Lithography, Nanoparticles, Etching, Nickel, Reflectivity, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Nanocomposites, Absorption

Proceedings Article | 10 May 2016
Proc. SPIE. 9984, Photomask Japan 2016: XXIII Symposium on Photomask and Next-Generation Lithography Mask Technology
KEYWORDS: Optical lithography, Phase contrast, Sensors, Metals, Inspection, Scanning electron microscopy, Photomasks, Extreme ultraviolet, Signal detection, Defect inspection

SPIE Journal Paper | 12 April 2016
JM3 Vol. 15 Issue 02
KEYWORDS: Inspection, Extreme ultraviolet, Photomasks, Semiconducting wafers, Metals, Extreme ultraviolet lithography, Multilayers, Etching, Deep ultraviolet, Scanning electron microscopy

Showing 5 of 20 publications
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