Kang-San Lee
Manager at ASML Korea
SPIE Involvement:
Author
Publications (4)

Proceedings Article | 20 March 2020
Proc. SPIE. 11325, Metrology, Inspection, and Process Control for Microlithography XXXIV
KEYWORDS: Metrology, Spatial frequencies, Etching, Scanners, Inspection, High volume manufacturing, Feedback loops, Semiconducting wafers, Overlay metrology

Proceedings Article | 20 March 2020
Proc. SPIE. 11325, Metrology, Inspection, and Process Control for Microlithography XXXIV
KEYWORDS: Metrology, Spatial frequencies, Etching, Scanners, Inspection, High volume manufacturing, Feedback loops, Semiconducting wafers, Overlay metrology

Proceedings Article | 26 March 2019
Proc. SPIE. 10959, Metrology, Inspection, and Process Control for Microlithography XXXIII
KEYWORDS: Metrology, Printing, Extreme ultraviolet lithography, Critical dimension metrology, Semiconducting wafers, Failure analysis

Proceedings Article | 20 March 2019
Proc. SPIE. 10961, Optical Microlithography XXXII
KEYWORDS: Lithography, Metrology, Data modeling, Sensors, Calibration, Scanners, High volume manufacturing, Optical alignment, Semiconducting wafers, Overlay metrology

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