Dr. Kensuke Matsuzawa
at Tokyo Ohka Kogyo Co Ltd
SPIE Involvement:
Author
Publications (4)

PROCEEDINGS ARTICLE | March 20, 2015
Proc. SPIE. 9425, Advances in Patterning Materials and Processes XXXII
KEYWORDS: Thin films, Deep ultraviolet, Polymers, Ultraviolet radiation, Diffusion, Bioalcohols, Photoresist materials, Extreme ultraviolet lithography, Semiconducting wafers, Absorption

PROCEEDINGS ARTICLE | March 23, 2012
Proc. SPIE. 8322, Extreme Ultraviolet (EUV) Lithography III
KEYWORDS: Lithography, Lithographic illumination, Deep ultraviolet, Polymers, Diffusion, Extreme ultraviolet, Line width roughness, Extreme ultraviolet lithography, Semiconducting wafers, Absorption

PROCEEDINGS ARTICLE | April 16, 2011
Proc. SPIE. 7972, Advances in Resist Materials and Processing Technology XXVIII
KEYWORDS: Lithography, Stars, Polymers, Diffusion, Image quality, Polymerization, Extreme ultraviolet lithography, Semiconducting wafers, Floods, Polymer thin films

PROCEEDINGS ARTICLE | April 1, 2009
Proc. SPIE. 7273, Advances in Resist Materials and Processing Technology XXVI
KEYWORDS: Lithography, Sensors, Polymers, Silicon, Hydrogen, Diffusion, Photoresist materials, Molecular interactions, Semiconducting wafers, Chemically amplified resists

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