Dr. Kevin Huang
Sr. Product Marketing Manager at KLA Tencor Corp
SPIE Involvement:
Author
Area of Expertise:
Overlay Metrology , Data Analysis , Photo lithography Control , Product Marketing
Publications (25)

PROCEEDINGS ARTICLE | March 28, 2017
Proc. SPIE. 10145, Metrology, Inspection, and Process Control for Microlithography XXXI
KEYWORDS: Semiconductors, Metrology, Optical lithography, Principal component analysis, Seaborgium, Manufacturing, Inspection, Control systems, Process control, Semiconductor manufacturing, Optical alignment, Semiconducting wafers, Tolerancing, Overlay metrology

PROCEEDINGS ARTICLE | March 19, 2015
Proc. SPIE. 9424, Metrology, Inspection, and Process Control for Microlithography XXIX
KEYWORDS: Semiconductors, Lithography, Scanners, Error analysis, Manufacturing, Distortion, Process control, Plasma enhanced chemical vapor deposition, Semiconducting wafers, Overlay metrology

PROCEEDINGS ARTICLE | March 19, 2015
Proc. SPIE. 9424, Metrology, Inspection, and Process Control for Microlithography XXIX
KEYWORDS: Semiconductors, Lithography, Optical lithography, Data modeling, Scanners, Dielectrophoresis, Process control, Photomasks, Semiconducting wafers, Overlay metrology

PROCEEDINGS ARTICLE | April 14, 2014
Proc. SPIE. 9050, Metrology, Inspection, and Process Control for Microlithography XXVIII
KEYWORDS: Lithography, Statistical analysis, Visual analytics, Data modeling, Visualization, Scanners, Atomic force microscopy, Optical alignment, Semiconducting wafers, Data analysis

PROCEEDINGS ARTICLE | April 2, 2014
Proc. SPIE. 9050, Metrology, Inspection, and Process Control for Microlithography XXVIII
KEYWORDS: Lithography, Etching, Scanners, Scatterometry, Finite element methods, Factory automation, High volume manufacturing, Critical dimension metrology, Semiconducting wafers, Scatter measurement

PROCEEDINGS ARTICLE | April 2, 2014
Proc. SPIE. 9050, Metrology, Inspection, and Process Control for Microlithography XXVIII
KEYWORDS: Optical lithography, Data modeling, Scanners, Error analysis, Control systems, Atomic force microscopy, Process control, Semiconducting wafers, Statistical modeling, Overlay metrology

Showing 5 of 25 publications
SIGN IN TO:
  • View contact details

UPDATE YOUR PROFILE
Is this your profile? Update it now.
Don’t have a profile and want one?

Back to Top