Mr. Marcel Mastenbroek Profile

Marcel Mastenbroek

at ASML Netherlands B.V.

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Author

Publications (8)

Proceedings Article | 16 November 2022 Presentation

0.33 NA EUV systems for high-volume manufacturing

Christophe Smeets, Guido Salmaso, Joe Carbone, Marcel Mastenbroek, Nico Benders, Roderik Van Es

Proceedings Volume PC12292, PC1229202 (2022) https://doi.org/10.1117/12.2644629

KEYWORDS: High volume manufacturing, Extreme ultraviolet, Scanners, Reliability, Overlay metrology, Logic devices, Critical dimension metrology, Control systems

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Proceedings Article | 13 June 2022 Presentation

0.33 NA EUV systems for high-volume manufacturing

Christophe Smeets, Guido Salmaso, Joe Carbone, Marcel Mastenbroek, Nico Benders, Roderik van Es, Roelof de Graaf

Proceedings Volume PC12051, PC1205103 (2022) https://doi.org/10.1117/12.2614220

KEYWORDS: Critical dimension metrology, Control systems, High volume manufacturing, Extreme ultraviolet, Scanners, Reliability, Overlay metrology, Logic devices, Logic

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Proceedings Article | 30 September 2021 Presentation

0.33 NA EUV systems for high-volume manufacturing

Christophe Smeets, Roderik Van Es, Roelof De Graaf, Leon Levasier, Marcel Mastenbroek, Eric Verhoeven

Proceedings Volume 11854, 1185404 (2021) https://doi.org/10.1117/12.2600961

KEYWORDS: High volume manufacturing, Extreme ultraviolet, Scanners, Reliability, Overlay metrology, Logic devices, Logic, Critical dimension metrology, Control systems

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Proceedings Article | 22 February 2021 Presentation

0.33 NA EUV systems for high-volume manufacturing

Eric Verhoeven, Ron Schuurhuis, Marcel Mastenbroek, Peter Jonkers, Frank Bornebroek, Arthur Minnaert, Harrie Van Dijck, Parham Yaghoobi, Geert Fisser, Payam Tayebati, Klaus Hummler, Roderik Van Es

Proceedings Volume 11609, 1160908 (2021) https://doi.org/10.1117/12.2583992

KEYWORDS: High volume manufacturing, Extreme ultraviolet lithography, Stochastic processes, Scanners, Overlay metrology, Logic, Lithography, Critical dimension metrology

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Proceedings Article | 22 September 2020 Presentation

0.33 NA EUV systems for High Volume Manufacturing

Eric Verhoeven, Ron Schuurhuis, Marcel Mastenbroek, Peter Jonkers, Frank Bornebroek, Arthur Minnaert, Harrie van Dijck, Parham Yaghoobi, Geert Fisser, Payam Tayebati, Martijn Leenders, Roderik van Es

Proceedings Volume 11517, 1151703 (2020) https://doi.org/10.1117/12.2572356

KEYWORDS: High volume manufacturing, Extreme ultraviolet, Logic devices, Manufacturing, Scanners, Lithography, Logic, Overlay metrology, Critical dimension metrology, Stochastic processes

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Proceedings Article | 26 September 2019 Presentation + Paper

Progress on 0.33 NA EUV systems for High-Volume Manufacturing

Marcel Mastenbroek

Proceedings Volume 11147, 1114703 (2019) https://doi.org/10.1117/12.2532110

KEYWORDS: High volume manufacturing, Extreme ultraviolet, Extreme ultraviolet lithography, Scanners, Logic, Pellicles, Lithography, Semiconducting wafers, Critical dimension metrology, Stochastic processes

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Proceedings Article | 3 October 2018 Paper

EUV industrialization high volume manufacturing with NXE3400B

Marcel Mastenbroek

Proceedings Volume 10809, 1080904 (2018) https://doi.org/10.1117/12.2502785

KEYWORDS: Lithography, Scanners, Extreme ultraviolet lithography, High volume manufacturing, Pellicles, Semiconducting wafers, Critical dimension metrology

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Proceedings Article | 20 March 2018 Presentation + Paper

Cross-platform (NXE-NXT) machine-to-machine overlay matching supporting next node chip manufacturing

Theo Thijssen, Marcel Beckers, Albert Mollema, Leon Levasier, Alexander Padi, Chia-Wei Hung, Hsiao-Lan Chen, Laurens van Bokhoven, Niels Lammers, Jean Phillippe van Damme, Floris Teeuwisse, Robin Tijssen, Wilson Tzeng, Cathy Wang, Marcel Mastenbroek, Harald Vos, Ting-Ju Yueh, Miao-Chi Chen , Hsueh-Hung Wu, Shin-Rung Peng, Chun-Kuang Chen, L. J. Chen , Kevin Cheng, John Lin

Proceedings Volume 10587, 1058709 (2018) https://doi.org/10.1117/12.2297387

KEYWORDS: Pellicles, Reticles, Deep ultraviolet, Overlay metrology, Extreme ultraviolet, Scanners, Distortion, Extreme ultraviolet lithography, Manufacturing, Semiconducting wafers

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Showing 5 of 8 publications

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