Masashi Enomoto
Researcher at Tokyo Electron Kyushu Ltd
SPIE Involvement:
Author
Publications (11)

Proceedings Article | 26 March 2019
Proc. SPIE. 10957, Extreme Ultraviolet (EUV) Lithography X
KEYWORDS: Scanners, Particles, Coating, Extreme ultraviolet, Extreme ultraviolet lithography, Critical dimension metrology, Semiconducting wafers, Stochastic processes

Proceedings Article | 26 March 2019
Proc. SPIE. 10959, Metrology, Inspection, and Process Control for Microlithography XXXIII
KEYWORDS: Image processing, Image analysis, Scanning electron microscopy, Gaussian filters, Image filtering, Line width roughness, Critical dimension metrology, Semiconducting wafers, Stochastic processes

Proceedings Article | 25 March 2019
Proc. SPIE. 10960, Advances in Patterning Materials and Processes XXXVI
KEYWORDS: Optical lithography, Statistical analysis, Etching, Critical dimension metrology, Semiconducting wafers, Stochastic processes, Overlay metrology

Proceedings Article | 10 October 2018
Proc. SPIE. 10809, International Conference on Extreme Ultraviolet Lithography 2018
KEYWORDS: Scanners, Particles, Coating, Extreme ultraviolet, Extreme ultraviolet lithography, Critical dimension metrology, Photoresist processing, Semiconducting wafers, Stochastic processes, System on a chip

Proceedings Article | 27 March 2018
Proc. SPIE. 10586, Advances in Patterning Materials and Processes XXXV
KEYWORDS: Calibration, Polymers, Ultraviolet radiation, Extreme ultraviolet, Image enhancement, Extreme ultraviolet lithography, Picosecond phenomena, Floods, Absorption, Chemically amplified resists

Proceedings Article | 19 March 2018
Proc. SPIE. 10583, Extreme Ultraviolet (EUV) Lithography IX
KEYWORDS: Particles, Coating, Manufacturing, Extreme ultraviolet, Extreme ultraviolet lithography, Critical dimension metrology, Photoresist processing, Semiconducting wafers, Yield improvement, System on a chip

Showing 5 of 11 publications
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