Masashi Enomoto
Researcher at Tokyo Electron Kyushu Ltd
SPIE Involvement:
Author
Publications (11)

Proceedings Article | 26 March 2019 Paper
Proc. SPIE. 10957, Extreme Ultraviolet (EUV) Lithography X
KEYWORDS: Semiconducting wafers, Critical dimension metrology, Particles, Stochastic processes, Coating, Extreme ultraviolet lithography, Scanners, Extreme ultraviolet

Proceedings Article | 26 March 2019 Paper
Proc. SPIE. 10959, Metrology, Inspection, and Process Control for Microlithography XXXIII
KEYWORDS: Line width roughness, Scanning electron microscopy, Image processing, Image analysis, Image filtering, Stochastic processes, Semiconducting wafers, Critical dimension metrology, Gaussian filters

Proceedings Article | 25 March 2019 Paper
Proc. SPIE. 10960, Advances in Patterning Materials and Processes XXXVI
KEYWORDS: Critical dimension metrology, Optical lithography, Overlay metrology, Etching, Stochastic processes, Semiconducting wafers, Statistical analysis

Proceedings Article | 10 October 2018 Paper
Proc. SPIE. 10809, International Conference on Extreme Ultraviolet Lithography 2018
KEYWORDS: Particles, Critical dimension metrology, Extreme ultraviolet lithography, Coating, Photoresist processing, Semiconducting wafers, Stochastic processes, Scanners, System on a chip, Extreme ultraviolet

Proceedings Article | 27 March 2018 Presentation + Paper
Proc. SPIE. 10586, Advances in Patterning Materials and Processes XXXV
KEYWORDS: Ultraviolet radiation, Floods, Picosecond phenomena, Extreme ultraviolet lithography, Calibration, Extreme ultraviolet, Chemically amplified resists, Polymers, Image enhancement, Absorption

Showing 5 of 11 publications
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