Shinji Mizutani
at NGR Inc.
SPIE Involvement:
Conference Program Committee | Author
Websites:
Publications (2)

Proceedings Article | 26 March 2019
Proc. SPIE. 10959, Metrology, Inspection, and Process Control for Microlithography XXXIII
KEYWORDS: Metrology, Logic, Metals, Inspection, Distortion, Scanning electron microscopy, Extreme ultraviolet, Extreme ultraviolet lithography, Critical dimension metrology, Semiconducting wafers

Proceedings Article | 16 July 2002
Proc. SPIE. 4689, Metrology, Inspection, and Process Control for Microlithography XVI
KEYWORDS: Optical imaging, Lithography, Microscopes, Metrology, Cameras, Optical testing, Scanning electron microscopy, CCD cameras, Cadmium sulfide, Critical dimension metrology

Conference Committee Involvement (1)
Photomask and Next-Generation Lithography Mask Technology XIII
18 April 2006 | Yokohama, Japan
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