Dr. Nobuyuki N. Matsuzawa
Principal Engineer & Director at Panasonic Industry Co., Ltd.
SPIE Involvement:
Conference Program Committee | Author
Publications (12)

Proceedings Article | 29 March 2006 Paper
Nobuyuki Matsuzawa, Boontarika Thunnakart, Ken Ozawa, Yuko Yamaguchi, Hiroyuki Nakano, Hiroichi Kawahira
Proceedings Volume 6153, 61531J (2006) https://doi.org/10.1117/12.651563
KEYWORDS: Silicon, Reflectivity, Oxides, Refractive index, Immersion lithography, Photoresist materials, Lithography, Optimization (mathematics), Polarization, Semiconductors

Proceedings Article | 29 March 2006 Paper
Hiroichi Kawahira, Nobuyuki Matsuzawa, Eriko Matsui, Atsuhiro Ando, Kazi M. A. Salam, Masashi Yoshida, Yuko Yamaguchi, Katsuhisa Kugimiya, Tetsuya Tatsumi, Hiroyuki Nakano, Takeshi Iwai, Makiko Irie
Proceedings Volume 6153, 615319 (2006) https://doi.org/10.1117/12.656002
KEYWORDS: Line width roughness, Photoresist materials, Etching, Plasma, Plasma treatment, Chemical analysis, FT-IR spectroscopy, Polymers, Lithography, Semiconducting wafers

Proceedings Article | 24 August 2001 Paper
Nobuyuki Matsuzawa, Akihiko Ishitani, David Dixon, Tsuyoshi Uda
Proceedings Volume 4345, (2001) https://doi.org/10.1117/12.436871
KEYWORDS: Absorbance, Molecules, Polymers, Lithography, Vacuum ultraviolet, Fluorine, Absorption, Photoresist materials, Polymethylmethacrylate, Oscillators

Proceedings Article | 24 August 2001 Paper
Manhyoung Ryoo, Shigeru Shirayone, Hiroaki Oizumi, Nobuyuki Matsuzawa, Shigeo Irie, Ei Yano, Shinji Okazaki
Proceedings Volume 4345, (2001) https://doi.org/10.1117/12.436814
KEYWORDS: Line edge roughness, Extreme ultraviolet lithography, Thin films, Lithography, Extreme ultraviolet, Atomic force microscopy, Scanning electron microscopy, Critical dimension metrology, Atomic force microscope, Image processing

Proceedings Article | 20 August 2001 Paper
Nobuyuki Matsuzawa, Shigeo Irie, Ei Yano, Shinji Okazaki, Akihiko Ishitani
Proceedings Volume 4343, (2001) https://doi.org/10.1117/12.436657
KEYWORDS: Polymers, Absorption, Oxygen, Chemical species, Silicon, Transmittance, Extreme ultraviolet, Extreme ultraviolet lithography, Photoresist processing, Carbon

Showing 5 of 12 publications
Conference Committee Involvement (18)
Advances in Patterning Materials and Processes XLI
26 February 2024 | San Jose, California, United States
Advances in Patterning Materials and Processes XL
27 February 2023 | San Jose, California, United States
Advances in Patterning Materials and Processes XXXIX
25 April 2022 | San Jose, California, United States
Advances in Patterning Materials and Processes XXXVIII
22 February 2021 | Online Only, California, United States
Advances in Patterning Materials and Processes XXXVII
24 February 2020 | San Jose, California, United States
Showing 5 of 18 Conference Committees
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