Omri Baum
at Applied Materials Israel Ltd
SPIE Involvement:
Publications (4)

SPIE Journal Paper | 4 November 2022
JM3, Vol. 21, Issue 04, 041605, (November 2022)
KEYWORDS: Etching, System on a chip, Image processing, Sensors, Lithography, Semiconducting wafers, Distance measurement, Process control, Transistors, Signal to noise ratio

Proceedings Article | 13 June 2022 Presentation
Proceedings Volume PC12053, PC120530D (2022)
KEYWORDS: Overlay metrology, Double patterning technology, Edge roughness, Scanning electron microscopy, Manufacturing, Line width roughness, Line edge roughness, Integrated circuits, Electron microscopy, Critical dimension metrology

Proceedings Article | 19 August 2021 Presentation + Paper
Yu Zhang, Biqiu Liu, Cong Zhang, Yuyang Bian, Song Gao, Yifei Zhu, Xiaobo Guo, Jun Huang, Yaniv Abramovitz, Qiang Zhou, Uri Smolyan, Omri Baum, Shmuel Ben Nissim, Alexander Vipolzov
Proceedings Volume 11611, 116111X (2021)
KEYWORDS: Overlay metrology, Instrument modeling, Semiconducting wafers, Measurement devices, Wafer-level optics, Mathematical modeling, Yield improvement, Etching, Optical testing, Data modeling

Proceedings Article | 7 May 2019 Presentation + Paper
Proceedings Volume 10959, 109591S (2019)
KEYWORDS: Stochastic processes, Metrology, Inspection, Scanning electron microscopy, Critical dimension metrology, Extreme ultraviolet, Error analysis, Defect inspection, Defect detection, Lithography

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