Mr. Paolo Petroni
Application Engineer at Aselta Nanographics
SPIE Involvement:
Author
Publications (2)

PROCEEDINGS ARTICLE | October 23, 2015
Proc. SPIE. 9635, Photomask Technology 2015
KEYWORDS: Metrology, Data modeling, Calibration, Data processing, Photomasks, Optical proximity correction, Mask making, Critical dimension metrology, Photoresist processing, Process modeling

PROCEEDINGS ARTICLE | September 9, 2013
Proc. SPIE. 8880, Photomask Technology 2013
KEYWORDS: Point spread functions, Detection and tracking algorithms, Scanning electron microscopy, Printing, Photomasks, Critical dimension metrology, Line edge roughness, Algorithm development, Tolerancing, Vestigial sideband modulation

SIGN IN TO:
  • View contact details

UPDATE YOUR PROFILE
Is this your profile? Update it now.
Don’t have a profile and want one?

Back to Top