Paolo Petroni
Application Engineer at Minatec;Aselta Nanographics
SPIE Involvement:
Author
Publications (4)

Proceedings Article | 26 March 2019
Proc. SPIE. 10959, Metrology, Inspection, and Process Control for Microlithography XXXIII
KEYWORDS: Metrology, Etching, Image processing, Image analysis, Scanning electron microscopy, Image quality, Process control, Optical proximity correction, Critical dimension metrology, Semiconducting wafers

Proceedings Article | 12 June 2018
Proc. SPIE. 10807, Photomask Japan 2018: XXV Symposium on Photomask and Next-Generation Lithography Mask Technology
KEYWORDS: Electron beam lithography, Metrology, Calibration, Etching, Metals, Manufacturing, Scanning electron microscopy, Photomasks, Critical dimension metrology, Model-based design

Proceedings Article | 23 October 2015
Proc. SPIE. 9635, Photomask Technology 2015
KEYWORDS: Metrology, Data modeling, Calibration, Data processing, Photomasks, Optical proximity correction, Mask making, Critical dimension metrology, Photoresist processing, Process modeling

Proceedings Article | 9 September 2013
Proc. SPIE. 8880, Photomask Technology 2013
KEYWORDS: Point spread functions, Detection and tracking algorithms, Scanning electron microscopy, Printing, Photomasks, Critical dimension metrology, Line edge roughness, Algorithm development, Tolerancing, Vestigial sideband modulation

SIGN IN TO:
  • View contact details

UPDATE YOUR PROFILE
Is this your profile? Update it now.
Don’t have a profile and want one?

Advertisement
Advertisement
Back to Top