Dr. Paolo Petroni
Application Engineer at Aselta Nanographics
SPIE Involvement:
Author
Publications (3)

PROCEEDINGS ARTICLE | June 12, 2018
Proc. SPIE. 10807, Photomask Japan 2018: XXV Symposium on Photomask and Next-Generation Lithography Mask Technology
KEYWORDS: Electron beam lithography, Metrology, Calibration, Etching, Metals, Manufacturing, Scanning electron microscopy, Photomasks, Critical dimension metrology, Model-based design

PROCEEDINGS ARTICLE | October 23, 2015
Proc. SPIE. 9635, Photomask Technology 2015
KEYWORDS: Metrology, Data modeling, Calibration, Data processing, Photomasks, Optical proximity correction, Mask making, Critical dimension metrology, Photoresist processing, Process modeling

PROCEEDINGS ARTICLE | September 9, 2013
Proc. SPIE. 8880, Photomask Technology 2013
KEYWORDS: Point spread functions, Detection and tracking algorithms, Scanning electron microscopy, Printing, Photomasks, Critical dimension metrology, Line edge roughness, Algorithm development, Tolerancing, Vestigial sideband modulation

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