Parkson W. Chen
at Taiwan Mask Corp
SPIE Involvement:
Author
Publications (7)

Proceedings Article | 28 May 2003 Paper
Proc. SPIE. 5148, 19th European Conference on Mask Technology for Integrated Circuits and Microcomponents
KEYWORDS: Reticles, Metrology, Deep ultraviolet, Cameras, Inspection, Objectives, Photomasks, Critical dimension metrology, Environmental sensing, Binary data

Proceedings Article | 28 May 2003 Paper
Proc. SPIE. 5148, 19th European Conference on Mask Technology for Integrated Circuits and Microcomponents
KEYWORDS: Reticles, Metrology, Calibration, Scanning electron microscopy, Pellicles, Photomasks, Critical dimension metrology, Semiconducting wafers, Binary data, 193nm lithography

Proceedings Article | 28 May 2003 Paper
Proc. SPIE. 5148, 19th European Conference on Mask Technology for Integrated Circuits and Microcomponents
KEYWORDS: Reticles, Metrology, Contamination, Deep ultraviolet, Manufacturing, Reliability, Lamps, Time metrology, Photomasks, Critical dimension metrology

Proceedings Article | 27 December 2002 Paper
Proc. SPIE. 4889, 22nd Annual BACUS Symposium on Photomask Technology
KEYWORDS: Reticles, Metrology, Deep ultraviolet, Image processing, Manufacturing, Photomasks, Computed tomography, Critical dimension metrology, Line edge roughness, Binary data

Proceedings Article | 16 August 2002 Paper
Proc. SPIE. 4764, 18th European Conference on Mask Technology for Integrated Circuits and Microcomponents
KEYWORDS: Semiconductors, Optical imaging, Reticles, Metrology, Deep ultraviolet, Manufacturing, Reliability, Photomasks, Critical dimension metrology, Optics manufacturing

Showing 5 of 7 publications
Proceedings Volume Editor (1)

Conference Committee Involvement (4)
Photomask and Next Generation Lithography Mask Technology XIV
17 April 2007 | Yokohama, Japan
Photomask and Next-Generation Lithography Mask Technology XIII
18 April 2006 | Yokohama, Japan
Photomask and Next-Generation Lithography Mask Technology XII
13 April 2005 | Yokohama, Japan
Photomask and NGL Mask Technology X
16 April 2003 | Yokohama, Japan
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