Parkson W. Chen
at Taiwan Mask Corp
SPIE Involvement:
Conference Co-Chair | Conference Program Committee | Author
Publications (8)

Proceedings Article | 28 May 2003
Proc. SPIE. 5148, 19th European Conference on Mask Technology for Integrated Circuits and Microcomponents
KEYWORDS: Photomasks, Critical dimension metrology, Reticles, Inspection, Deep ultraviolet, Metrology, Binary data, Objectives, Environmental sensing, Cameras

Proceedings Article | 28 May 2003
Proc. SPIE. 5148, 19th European Conference on Mask Technology for Integrated Circuits and Microcomponents
KEYWORDS: Scanning electron microscopy, Photomasks, Pellicles, Reticles, Calibration, Semiconducting wafers, Critical dimension metrology, Binary data, 193nm lithography, Metrology

Proceedings Article | 28 May 2003
Proc. SPIE. 5148, 19th European Conference on Mask Technology for Integrated Circuits and Microcomponents
KEYWORDS: Lamps, Reticles, Critical dimension metrology, Metrology, Contamination, Deep ultraviolet, Photomasks, Reliability, Time metrology, Manufacturing

Proceedings Article | 27 December 2002
Proc. SPIE. 4889, 22nd Annual BACUS Symposium on Photomask Technology
KEYWORDS: Reticles, Metrology, Deep ultraviolet, Photomasks, Critical dimension metrology, Line edge roughness, Binary data, Manufacturing, Computed tomography, Image processing

Showing 5 of 8 publications
Conference Committee Involvement (4)
Photomask and Next Generation Lithography Mask Technology XIV
17 April 2007 | Yokohama, Japan
Photomask and Next-Generation Lithography Mask Technology XIII
18 April 2006 | Yokohama, Japan
Photomask and Next-Generation Lithography Mask Technology XII
13 April 2005 | Yokohama, Japan
Photomask and NGL Mask Technology X
16 April 2003 | Yokohama, Japan
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