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Andrew Moe
at ASML Korea Co Ltd
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Publications (2)
Proceedings Article | 11 April 2017 Presentation + Paper
Process margin improvement through finger-print removal based on scanner leveling data
Jin Phil Choi, Dong Kyung Han, Young Jun Kim, Tony Park, Jeong Heung Kong, Young Seog Kang, Se Yeon Jang, Jeroen Cottaar, Jan-Pieter van Delft, Jeroen Rutten, Axel von Sydow, Marcel Bontekoe, Balaji Rangarajan, Khalid Elbattay, Andrew Moe, Chung-Yong Kim, Maarten Boogaarts, Arjan Donkerbroek, Ruiyue Ouyang
Proceedings Volume 10147, 1014709 (2017) https://doi.org/10.1117/12.2258184
KEYWORDS: Manufacturing
Proceedings Article | 24 March 2017 Presentation + Paper
Scanner-to-scanner CD analysis and control in an HVM environment
Tony Park, Jeong Heung Kong, Young Seog Kang, Se Yeon Jang, Peter Nikolsky, Chris Strolenberg, Noh-Kyoung Park, Khalid Elbattay, Vito Tomasello, Anand Guntuka, Zhao-Ze Li, Ronald Goossens, Machi Ryu, Jangho Shin, Chung-Yong Kim, Andrew Moe, Yun-A Sung, Du Hyun Beak, Ju Hee Shin, Jin Phil Choi, Dong Kyeng Han, Austin Peng
Proceedings Volume 10147, 101470A (2017) https://doi.org/10.1117/12.2258339
KEYWORDS: Critical dimension metrology, Scanners, Lithographic illumination, Image processing, Process control, Computational lithography, Semiconducting wafers, Data modeling, Metrology, Photomasks, Calibration, Finite element methods, Laser scanners, 3D scanning
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