Sherif Hany Mousa
SPIE Involvement:
Author
Publications (2)

Proceedings Article | 23 March 2020
Proc. SPIE. 11327, Optical Microlithography XXXIII
KEYWORDS: Lithography, Pattern recognition, Manufacturing, Optical proximity correction, SRAF, Model-based design, Resolution enhancement technologies

Proceedings Article | 20 March 2018
Proc. SPIE. 10587, Optical Microlithography XXXI
KEYWORDS: Lithography, Manufacturing, Computer simulations, Photomasks, Optical proximity correction, SRAF, Semiconducting wafers

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