Dr. Soichi Inoue
Senior Manager at Toshiba Corp
SPIE Involvement:
Conference Program Committee | Author
Publications (102)

PROCEEDINGS ARTICLE | March 18, 2016
Proc. SPIE. 9776, Extreme Ultraviolet (EUV) Lithography VII
KEYWORDS: Lithography, Mirrors, Optical design, Reticles, Optical lithography, Polarization, Process control, Projection systems, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Semiconducting wafers

PROCEEDINGS ARTICLE | March 19, 2015
Proc. SPIE. 9422, Extreme Ultraviolet (EUV) Lithography VI
KEYWORDS: Mirrors, Scanners, Carbon dioxide lasers, Pellicles, Relays, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Semiconducting wafers, Plasma

PROCEEDINGS ARTICLE | March 13, 2015
Proc. SPIE. 9422, Extreme Ultraviolet (EUV) Lithography VI
KEYWORDS: Mirrors, Contamination, Data modeling, Scanners, Spectroscopy, Reflectivity, Extreme ultraviolet, Extreme ultraviolet lithography, Systems modeling, EUV optics

PROCEEDINGS ARTICLE | March 13, 2015
Proc. SPIE. 9422, Extreme Ultraviolet (EUV) Lithography VI
KEYWORDS: Lithography, Electron beams, Contamination, Molecules, Extreme ultraviolet, Extreme ultraviolet lithography, Picosecond phenomena, Semiconducting wafers, Standards development, Temperature metrology

PROCEEDINGS ARTICLE | April 17, 2014
Proc. SPIE. 9048, Extreme Ultraviolet (EUV) Lithography V
KEYWORDS: Contamination, Sulfur, Hydrogen, Reflectivity, Iodine, Extreme ultraviolet, Extreme ultraviolet lithography, Chlorine, Bromine, Protactinium

PROCEEDINGS ARTICLE | April 17, 2014
Proc. SPIE. 9048, Extreme Ultraviolet (EUV) Lithography V
KEYWORDS: Carbon, Contamination, Statistical analysis, Molecules, Electrons, Extreme ultraviolet, Extreme ultraviolet lithography, Semiconducting wafers, Statistical modeling, Protactinium

Showing 5 of 102 publications
Conference Committee Involvement (11)
Extreme Ultraviolet (EUV) Lithography X
25 February 2019 | San Jose, California, United States
Extreme Ultraviolet (EUV) Lithography IX
26 February 2018 | San Jose, California, United States
Extreme Ultraviolet (EUV) Lithography VIII
27 February 2017 | San Jose, California, United States
Extreme Ultraviolet (EUV) Lithography VII
22 February 2016 | San Jose, California, United States
Extreme Ultraviolet (EUV) Lithography VI
23 February 2015 | San Jose, California, United States
Showing 5 of 11 published special sections
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