Tah-Te Shih
at TSMC
SPIE Involvement:
Author
Publications (2)

PROCEEDINGS ARTICLE | December 12, 2009
Proc. SPIE. 7520, Lithography Asia 2009
KEYWORDS: Semiconducting wafers, Optical alignment, Distortion, Overlay metrology, Front end of line, Lithography, Scanners, Capacitance, Current controlled current source, Yield improvement

PROCEEDINGS ARTICLE | December 12, 2009
Proc. SPIE. 7520, Lithography Asia 2009
KEYWORDS: Inspection, Photomasks, Reticles, Air contamination, Semiconducting wafers, Defect detection, Optical proximity correction, SRAF, Image transmission, Sensors

SIGN IN TO:
  • View contact details

UPDATE YOUR PROFILE
Is this your profile? Update it now.
Don’t have a profile and want one?

Back to Top