Anna Tchikoulaeva
at Lasertec USA Inc
SPIE Involvement:
Conference Program Committee | Author
Publications (13)

PROCEEDINGS ARTICLE | April 10, 2013
Proc. SPIE. 8681, Metrology, Inspection, and Process Control for Microlithography XXVII
KEYWORDS: Reticles, Defect detection, Manufacturing, Inspection, Parallel processing, Photomasks, Factory automation, Semiconducting wafers, Wafer manufacturing, Defect inspection

PROCEEDINGS ARTICLE | April 1, 2013
Proc. SPIE. 8679, Extreme Ultraviolet (EUV) Lithography IV
KEYWORDS: Mirrors, Metrology, Defect detection, Inspection, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, High volume manufacturing, Prototyping, Defect inspection

PROCEEDINGS ARTICLE | October 14, 2011
Proc. SPIE. 8166, Photomask Technology 2011
KEYWORDS: Reticles, Defect detection, Metals, Glasses, Particles, Manufacturing, Inspection, Photomasks, Critical dimension metrology, Semiconducting wafers

PROCEEDINGS ARTICLE | October 14, 2011
Proc. SPIE. 8166, Photomask Technology 2011
KEYWORDS: Multilayers, Reticles, Metrology, Etching, Metals, Scanners, 3D metrology, Photomasks, Critical dimension metrology, Semiconducting wafers

PROCEEDINGS ARTICLE | May 25, 2010
Proc. SPIE. 7748, Photomask and Next-Generation Lithography Mask Technology XVII
KEYWORDS: Data modeling, Quartz, Air contamination, Ions, Nitrogen, Inspection, Scanning electron microscopy, Photomasks, Chemical analysis, Oxidation

PROCEEDINGS ARTICLE | March 20, 2010
Proc. SPIE. 7636, Extreme Ultraviolet (EUV) Lithography
KEYWORDS: Reticles, Optical lithography, Defect detection, Inspection, Scanning electron microscopy, Photomasks, Extreme ultraviolet, Line edge roughness, Semiconducting wafers, Defect inspection

Showing 5 of 13 publications
Conference Committee Involvement (13)
Extreme Ultraviolet (EUV) Lithography IX
26 February 2018 | San Jose, California, United States
Extreme Ultraviolet (EUV) Lithography VIII
27 February 2017 | San Jose, California, United States
Photomask Technology
12 September 2016 | San Jose, California, United States
Extreme Ultraviolet (EUV) Lithography VII
22 February 2016 | San Jose, California, United States
Photomask Technology 2015
29 September 2015 | Monterey, California, United States
Showing 5 of 13 published special sections
SIGN IN TO:
  • View contact details

UPDATE YOUR PROFILE
Is this your profile? Update it now.
Don’t have a profile and want one?

Back to Top