TeHung Wu
Senior Manager at Mentor Graphics Taiwan Ltd
SPIE Involvement:
Author
Publications (7)

PROCEEDINGS ARTICLE | October 14, 2011
Proc. SPIE. 8166, Photomask Technology 2011
KEYWORDS: Logic, Detection and tracking algorithms, Image segmentation, Photomasks, Source mask optimization, SRAF, Critical dimension metrology, Optimization (mathematics), Semiconducting wafers, Fiber optic illuminators

PROCEEDINGS ARTICLE | March 26, 2007
Proc. SPIE. 6520, Optical Microlithography XX
KEYWORDS: Metrology, Data modeling, Calibration, Image processing, Feature extraction, Scanning electron microscopy, Optical proximity correction, Semiconducting wafers, Process modeling, Resolution enhancement technologies

PROCEEDINGS ARTICLE | March 21, 2007
Proc. SPIE. 6521, Design for Manufacturability through Design-Process Integration
KEYWORDS: Lithography, Image processing, Resistance, Photomasks, Transistors, Integrated circuits, Semiconducting wafers, Integrated circuit design, Overlay metrology, Classification systems

PROCEEDINGS ARTICLE | March 15, 2006
Proc. SPIE. 6155, Data Analysis and Modeling for Process Control III
KEYWORDS: Lithography, Lithographic illumination, Data modeling, Calibration, Scanners, Projection systems, Photomasks, Optical proximity correction, Critical dimension metrology, Optical calibration

PROCEEDINGS ARTICLE | May 4, 2005
Proc. SPIE. 5753, Advances in Resist Technology and Processing XXII
KEYWORDS: Optical lithography, Image processing, Coating, Line width roughness, Chemical reactions, Critical dimension metrology, Line edge roughness, Photoresist processing, Semiconducting wafers, Resolution enhancement technologies

PROCEEDINGS ARTICLE | May 12, 2004
Proc. SPIE. 5754, Optical Microlithography XVIII
KEYWORDS: Lithography, Cadmium, Manufacturing, Photomasks, Optical proximity correction, SRAF, Critical dimension metrology, Semiconducting wafers, Resolution enhancement technologies, Fiber optic illuminators

Showing 5 of 7 publications
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