Dr. Weijie Shi
at Dongfang Jingyuan Electron Ltd
SPIE Involvement:
Author
Publications (6)

SPIE Journal Paper | 9 September 2020
JM3 Vol. 19 Issue 03

Proceedings Article | 20 March 2019 Paper
Proc. SPIE. 10961, Optical Microlithography XXXII
KEYWORDS: SRAF, Printing, Optical proximity correction, Lithography, Photomasks, Photovoltaics, Model-based design, Semiconducting wafers, Process modeling, Critical dimension metrology

SPIE Journal Paper | 24 January 2019
JM3 Vol. 18 Issue 01
KEYWORDS: Particle filters, Filtering (signal processing), Thermal modeling, Particles, Semiconducting wafers, Projection systems, Lithography, Photomasks, Data modeling, Calibration

Proceedings Article | 24 July 2018 Paper
Proc. SPIE. 10827, Sixth International Conference on Optical and Photonic Engineering (icOPEN 2018)
KEYWORDS: Optical lithography, Optical design, Fourier transforms, Device simulation, Resolution enhancement technologies, Micromirrors, Homogenization, Source mask optimization, Lens design, Optical simulations

Proceedings Article | 24 July 2018 Paper
Proc. SPIE. 10827, Sixth International Conference on Optical and Photonic Engineering (icOPEN 2018)
KEYWORDS: Optical lithography, Diffractive optical elements, Device simulation, Lithography, Critical dimension metrology, Optical design, Lithographic illumination, Optoelectronics, Resolution enhancement technologies, Standards development

Showing 5 of 6 publications
SIGN IN TO:
  • View contact details

UPDATE YOUR PROFILE
Is this your profile? Update it now.
Don’t have a profile and want one?

Advertisement
Advertisement
Back to Top