Dr. Weijie Shi
at Dongfang Jingyuan Electron Ltd
SPIE Involvement:
Author
Publications (5)

Proceedings Article | 20 March 2019
Proc. SPIE. 10961, Optical Microlithography XXXII
KEYWORDS: Lithography, Photovoltaics, Printing, Photomasks, Optical proximity correction, SRAF, Critical dimension metrology, Semiconducting wafers, Model-based design, Process modeling

SPIE Journal Paper | 24 January 2019
JM3 Vol. 18 Issue 01
KEYWORDS: Particle filters, Filtering (signal processing), Thermal modeling, Particles, Semiconducting wafers, Projection systems, Lithography, Photomasks, Data modeling, Calibration

Proceedings Article | 24 July 2018
Proc. SPIE. 10827, Sixth International Conference on Optical and Photonic Engineering (icOPEN 2018)
KEYWORDS: Lithography, Optical design, Optical lithography, Lithographic illumination, Diffractive optical elements, Optoelectronics, Critical dimension metrology, Device simulation, Standards development, Resolution enhancement technologies

Proceedings Article | 24 July 2018
Proc. SPIE. 10827, Sixth International Conference on Optical and Photonic Engineering (icOPEN 2018)
KEYWORDS: Optical design, Optical lithography, Homogenization, Fourier transforms, Lens design, Micromirrors, Optical simulations, Source mask optimization, Device simulation, Resolution enhancement technologies

Proceedings Article | 20 March 2018
Proc. SPIE. 10587, Optical Microlithography XXXI
KEYWORDS: Lithography, Optical lithography, Data modeling, Manufacturing, Particle filters, Projection systems, Semiconducting wafers, Thermal modeling

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