Dr. Yan A. Liu
Process Engineer at Intel Corp
SPIE Involvement:
Author
Publications (3)

Proceedings Article | 23 March 2012
Proc. SPIE. 8322, Extreme Ultraviolet (EUV) Lithography III
KEYWORDS: Electron beam lithography, Silica, Inspection, Atomic force microscopy, Scanning electron microscopy, Precision measurement, Photomasks, Extreme ultraviolet lithography, Optical alignment, Defect inspection

Proceedings Article | 23 September 2009
Proc. SPIE. 7488, Photomask Technology 2009
KEYWORDS: Metrology, Manufacturing, Inspection, Computer simulations, Data processing, Photomasks, Data conversion, Semiconducting wafers, Standards development, Vestigial sideband modulation

Proceedings Article | 14 May 2007
Proc. SPIE. 6607, Photomask and Next-Generation Lithography Mask Technology XIV
KEYWORDS: Wafer-level optics, Light sources, Spatial frequencies, Fourier transforms, Scanning electron microscopy, Photomasks, Line width roughness, Line edge roughness, Semiconducting wafers, Decision support systems

SIGN IN TO:
  • View contact details

UPDATE YOUR PROFILE
Is this your profile? Update it now.
Don’t have a profile and want one?

Advertisement
Advertisement
Back to Top