Yonghyeon Kim
at SAMSUNG Electronics Co Ltd
SPIE Involvement:
Publications (6)

Proceedings Article | 16 March 2016 Paper
Daehan Han, Jinman Chang, Taeheon Kim, Kyusun Lee, Yonghyeon Kim, Jinyoung Kang, Aeran Hong, Bumjin Choi, Joosung Lee, Hyoung Jun Kim, Kweonjae Lee, Hyoungsun Hong, Gyoyoung Jin
Proceedings Volume 9781, 97810R (2016) https://doi.org/10.1117/12.2218414
KEYWORDS: Inspection, Quantitative analysis, Defect detection, Image processing, Solids, Design for manufacturing, Design for manufacturability, Manufacturing, Semiconducting wafers, Error analysis, Critical dimension metrology, Double patterning technology, Metrology

Proceedings Article | 19 March 2015 Paper
Kyusun Lee, Kweonjae Lee, Jinman Chang, Taeheon Kim, Daehan Han, Aeran Hong, Yonghyeon Kim, Jinyoung Kang, Bumjin Choi, Joosung Lee, Jooyoung Lee, Hyeongsun Hong, Kyupil Lee, Gyoyoung Jin
Proceedings Volume 9424, 94241D (2015) https://doi.org/10.1117/12.2084992
KEYWORDS: Semiconducting wafers, Inspection, Composites, Scanning electron microscopy, Reticles, Double patterning technology, Sensors, Optical lithography, Etching, Line edge roughness

Proceedings Article | 18 March 2015 Paper
Yonghyeon Kim, Kweonjae Lee, Jinman Chang, Taeheon Kim, Daehan Han, Kyusun Lee, Aeran Hong, Jinyoung Kang, Bumjin Choi, Joosung Lee, Kyehee Yeom, Jooyoung Lee, Hyeongsun Hong, Kyupil Lee, Gyoyoung Jin
Proceedings Volume 9427, 942713 (2015) https://doi.org/10.1117/12.2085004
KEYWORDS: Bridges, Overlay metrology, Inspection, Composites, Metrology, Error analysis, Semiconducting wafers, Optical lithography, Lithography, Defect inspection

Proceedings Article | 15 March 2012 Paper
Tae-Heon Kim, Dae-Han Han, Ae-Ran Hong, Yong-Hyeon Kim, Joo-Sung Lee, Yun-Hye Chu, Kweon-Jae Lee, Yong-Jik Park
Proceedings Volume 8327, 83270Y (2012) https://doi.org/10.1117/12.915934
KEYWORDS: Transistors, Optical proximity correction, Critical dimension metrology, Lithography, Semiconducting wafers, Design for manufacturing, Etching, Image classification, Photomasks, Manufacturing

Proceedings Article | 5 April 2011 Paper
Tae Heon Kim, Dae-Han Han, Yong-Hyeon Kim, Min-Chul Han, Hong-Ji Lee, Ae-Ran Hong, Yoon-Min Kim, In-Ho Nam, Yong-Jik Park, Kyung-Seok Oh
Proceedings Volume 7974, 79740Q (2011) https://doi.org/10.1117/12.879033
KEYWORDS: Critical dimension metrology, Inspection, Semiconducting wafers, Manufacturing, Transistors, Etching, Lithography, Control systems, Design for manufacturability, Photomasks

Showing 5 of 6 publications
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