Dr. Yongjun Wang
at ASML
SPIE Involvement:
Author
Publications (3)

Proceedings Article | 26 March 2019
Proc. SPIE. 10959, Metrology, Inspection, and Process Control for Microlithography XXXIII
KEYWORDS: Metrology, Optical lithography, Statistical analysis, Etching, Error analysis, Reliability, Control systems, Scanning electron microscopy, Critical dimension metrology, Semiconducting wafers

Proceedings Article | 26 March 2019
Proc. SPIE. 10959, Metrology, Inspection, and Process Control for Microlithography XXXIII
KEYWORDS: Metrology, Logic, Error analysis, Copper, Inspection, Scanning electron microscopy, Wafer inspection, Photomasks, Overlay metrology, Process modeling

SPIE Journal Paper | 17 August 2018
JM3 Vol. 17 Issue 04
KEYWORDS: Semiconducting wafers, Scanning electron microscopy, Stochastic processes, Critical dimension metrology, Metrology, Photomasks, Inspection, Optical proximity correction, Electron beam lithography, Etching

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