Mr. Yoshiyuki Kikuchi
at Tokyo Electron Limited
SPIE Involvement:
Author
Publications (1)

PROCEEDINGS ARTICLE | March 28, 2014
Proc. SPIE. 9054, Advanced Etch Technology for Nanopatterning III
KEYWORDS: Chemical species, Annealing, Copper, Silicon, Diffusion, Chemical vapor deposition, Oxygen, Silicon films, Plasma enhanced chemical vapor deposition, Plasma

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