Mr. Young Ki Kim
at GLOBALFOUNDRIES Inc
SPIE Involvement:
Author
Publications (8)

PROCEEDINGS ARTICLE | March 28, 2017
Proc. SPIE. 10145, Metrology, Inspection, and Process Control for Microlithography XXXI
KEYWORDS: Lithography, Diffraction, Reticles, Metrology, Calibration, Scanners, Process control, Critical dimension metrology, Semiconducting wafers, Overlay metrology

PROCEEDINGS ARTICLE | March 24, 2016
Proc. SPIE. 9778, Metrology, Inspection, and Process Control for Microlithography XXX
KEYWORDS: Lithography, Diffraction, Metrology, Scanners, Error analysis, Control systems, Time metrology, Process control, High volume manufacturing, Critical dimension metrology, Forward error correction, Semiconducting wafers

PROCEEDINGS ARTICLE | March 15, 2016
Proc. SPIE. 9780, Optical Microlithography XXIX
KEYWORDS: Reticles, Metrology, Scanners, Laser processing, Laser scanners, Photomasks, 3D scanning, Critical dimension metrology, Laser metrology, Semiconducting wafers

PROCEEDINGS ARTICLE | March 19, 2015
Proc. SPIE. 9424, Metrology, Inspection, and Process Control for Microlithography XXIX
KEYWORDS: Lithography, Metrology, Data modeling, Scanners, Scatterometry, Finite element methods, Critical dimension metrology, Semiconducting wafers, Model-based design, Single crystal X-ray diffraction

PROCEEDINGS ARTICLE | April 14, 2014
Proc. SPIE. 9050, Metrology, Inspection, and Process Control for Microlithography XXVIII
KEYWORDS: Lithography, Statistical analysis, Visual analytics, Data modeling, Visualization, Scanners, Atomic force microscopy, Optical alignment, Semiconducting wafers, Data analysis

PROCEEDINGS ARTICLE | April 2, 2014
Proc. SPIE. 9050, Metrology, Inspection, and Process Control for Microlithography XXVIII
KEYWORDS: Lithography, Etching, Scanners, Scatterometry, Finite element methods, Factory automation, High volume manufacturing, Critical dimension metrology, Semiconducting wafers, Scatter measurement

Showing 5 of 8 publications
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