Young Ki Kim
at GLOBALFOUNDRIES Inc
SPIE Involvement:
Author
Publications (9)

Proceedings Article | 22 January 2018
Proc. SPIE. 10147, Optical Microlithography XXX
KEYWORDS: Monochromatic aberrations, Reticles, Optical lithography, Calibration, Scanners, Software development, Semiconducting wafers, Current controlled current source

Proceedings Article | 28 March 2017
Proc. SPIE. 10145, Metrology, Inspection, and Process Control for Microlithography XXXI
KEYWORDS: Lithography, Diffraction, Reticles, Metrology, Calibration, Scanners, Process control, Critical dimension metrology, Semiconducting wafers, Overlay metrology

Proceedings Article | 24 March 2016
Proc. SPIE. 9778, Metrology, Inspection, and Process Control for Microlithography XXX
KEYWORDS: Lithography, Diffraction, Metrology, Scanners, Error analysis, Control systems, Time metrology, Process control, High volume manufacturing, Critical dimension metrology, Forward error correction, Semiconducting wafers

Proceedings Article | 15 March 2016
Proc. SPIE. 9780, Optical Microlithography XXIX
KEYWORDS: Reticles, Metrology, Scanners, Laser processing, Laser scanners, Photomasks, 3D scanning, Critical dimension metrology, Laser metrology, Semiconducting wafers

Proceedings Article | 19 March 2015
Proc. SPIE. 9424, Metrology, Inspection, and Process Control for Microlithography XXIX
KEYWORDS: Lithography, Metrology, Data modeling, Scanners, Scatterometry, Finite element methods, Critical dimension metrology, Semiconducting wafers, Model-based design, Single crystal X-ray diffraction

Showing 5 of 9 publications
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