Integral imaging system with soft substrate is proposed and fabricated by lithographic method. The integral imaging
system consists of microlens array and micro-image array. Based on the optical design theory, the geometrical
parameters of the microlens array and micro-image array is calculated and simulated by the software Tracepro.
Furthermore, some experiments are carried out. The microlens array and micro-image array is fabricated on
Polyethylene Terephthalate substrate by lithographic method. After the alignment between the microlens array and the
micro-image array, three dimensional image can be formed over the microlens array. The imaging system is easy to
curve and can be used on some static displays, such as three dimensional display, three dimensional picture and so on.
This paper presents an approach used to fabricate resonant subwavelength grating based on thiol-ene material. First of all, polydimethylsiloxane soft imprint stamp with opposite structure of the subwavelength grating master mold is made by casting. Then, the desired subwavelength grating with UV-curable thiol-ene material grating structure is fabricated using the polydimethylsioxane soft stamp by UV-curable soft-lithography. Here, we fabricate a subwavelength grating with period of 300nm using the approach, which could reflect blue light with wavelength ranging from 448nm to 482nm at a specific angle and presents the excellent resonant characteristic. The experimental results are consistent with the simulation results, demonstrating that the approach proposed in this paper could effectively fabricate the thiol-ene material resonant subwavelength grating structure. The thiol-ene material is a new green UV-curable polymer material, including a number of advantages such as rapid UV-curing in the natural environment, low-cost, high resolution, and regulative performance characteristic. The fabrication technique in this paper is simple, low-cost, and easy to high throughput, which has broad application prospects in the preparation of micro and nano structures.
Novel antireflective surfaces with silica particles arranged regularly and tightly are proposed and fabricated by self
assemble silica nanoparticle through electrostatic attraction between charged colloidal particles and charged
polyelectrolyte multilayer. Due to regularly arrangement of the particles, the nanoparticle coatings, as homogeneous
porous layers with uniform distribution, show high-quality and uniform antireflective capability in each region on the
substrate. It has been sufficiently demonstrated in our experiments. Furthermore, the relations among the antireflective
capability, average size of nanoparticles, and incident angle of the irradiated light are calculated by finite-difference
time-domain method. It is demonstrated that the nanostructure coatings with particles of 100 nm size possess the
excellently suitable performance for reflection/transmission with respect to visible-light region. From the results, the
fabricated anti-reflective nanostructures have great potential to improve the efficiency of optoelectronic devices such as a
photo-detector and solar cells.
A compound-eye imaging system has been proposed in which the microlenses arranged in a convex solid substrate are
designed for satisfying the requirement of both a large field of view and a flat receiving plane. Based on the geometrical
optics, the formulas are established for determining the parameters of the microlens in the different positions so that the
focal spots of the microlens array can properly be settled on a flat plane. With the method, ray tracing is carried out for
simulating the focusing process of the compound-eye imaging system. The results show that the focal spots distributed
on a plane are achieved and the field of view of the system can be up to 60°.