Yunyun Hao
Student at Institute of Microelectronics of the CAS
SPIE Involvement:
Author
Publications (2)

Proceedings Article | 26 September 2019
Proc. SPIE. 11147, International Conference on Extreme Ultraviolet Lithography 2019
KEYWORDS: Lithography, Polishing, Deep ultraviolet, Manufacturing, Reflectivity, Photomasks, Extreme ultraviolet, Plasma etching, Extreme ultraviolet lithography, Optical proximity correction

Proceedings Article | 24 October 2017
Proc. SPIE. 10460, AOPC 2017: Optoelectronics and Micro/Nano-Optics

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