Dr. Zhigang Wang
at Hitachi High-Tech Science Corp
SPIE Involvement:
Author
Publications (5)

Proceedings Article | 29 March 2019
Proc. SPIE. 10959, Metrology, Inspection, and Process Control for Microlithography XXXIII
KEYWORDS: Lithography, Metrology, Image processing, Error analysis, Scanning electron microscopy, Process control, Extreme ultraviolet, Extreme ultraviolet lithography, Semiconducting wafers, Stochastic processes

Proceedings Article | 2 April 2010
Proc. SPIE. 7638, Metrology, Inspection, and Process Control for Microlithography XXIV
KEYWORDS: Semiconductors, Metrology, Silicon, Inspection, Process control, Photomasks, Shape analysis, Optical proximity correction, Computer aided design, Semiconducting wafers

Proceedings Article | 1 November 2007
Proc. SPIE. 6730, Photomask Technology 2007
KEYWORDS: Optical design, Metrology, Contamination, Imaging systems, Image processing, Ultraviolet radiation, Inspection, Scanning electron microscopy, Photomasks, Critical dimension metrology

Proceedings Article | 20 August 2004
Proc. SPIE. 5446, Photomask and Next-Generation Lithography Mask Technology XI
KEYWORDS: Electron beams, Calibration, Manufacturing, Photomasks, Optical simulations, Optical proximity correction, Critical dimension metrology, Data conversion, Optics manufacturing, Vestigial sideband modulation

Proceedings Article | 17 December 2003
Proc. SPIE. 5256, 23rd Annual BACUS Symposium on Photomask Technology
KEYWORDS: Semiconductors, Lithography, Monochromatic aberrations, Optical design, Electron beams, Metrology, Electrodes, Photomasks, Optical proximity correction, Electromagnetism

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