From Event: SPIE Advanced Lithography + Patterning, 2023
Free-form ILT has the best lithography quality but suffers long runtime and large file sizes. The shortcomings can be mitigated by using spline-polygon curvilinear mask. Further more curvilinear OPC can be used to drive down the EPE, further improving the runtime and correction quality
© (2023) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Danping Peng, Shang-Jung Wu, Jue-Chin Yu, Chia-Hua Chang, and Kenneth Ho, "Curvilinear mask: bridging ILT to HVM," Proc. SPIE 12495, DTCO and Computational Patterning II, 124950I (Presented at SPIE Advanced Lithography + Patterning: February 28, 2023; Published: 30 April 2023); https://doi.org/10.1117/12.2661726.6323677655112.