Presentation
5 March 2022 Optimizing laser speckle production and analysis for high precision metrology
Morgan Facchin, Graham D. Bruce, Laura O'Donnell, Kishan Dholakia
Author Affiliations +
Proceedings Volume PC12008, Photonic Instrumentation Engineering IX; PC1200806 (2022) https://doi.org/10.1117/12.2608144
Event: SPIE OPTO, 2022, San Francisco, California, United States
Abstract
Speckle patterns have proven to be a versatile tool in various areas of metrology. Different levels of resolution have been achieved depending on how the speckles are produced and the analysis method that is employed. We show three particular applications of speckle metrology: measurement of refractive index variation (10^-10 uncertainty), wavelength variations (10^-18 m uncertainty), and displacement (10^-11 m uncertainty), where the uncertainties are made very low by an appropriate choice of scattering geometry and analysis method. We explore this both analytically and experimentally. We also discuss the multiplexing capability of speckle patterns, and demonstrate this capability for the simultaneous measurement of polarisation and wavelength variation of multiple light sources.
Conference Presentation
© (2022) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Morgan Facchin, Graham D. Bruce, Laura O'Donnell, and Kishan Dholakia "Optimizing laser speckle production and analysis for high precision metrology", Proc. SPIE PC12008, Photonic Instrumentation Engineering IX, PC1200806 (5 March 2022); https://doi.org/10.1117/12.2608144
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KEYWORDS
Metrology

Laser metrology

Speckle

Speckle pattern

Photonics

Physics

Polarization

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