One Micron Range Photoresist Imaging: A Practical Approach

David J. Elliott; Mary Ann Hockey

doi:10.1117/12.956123

6 September 1978 One Micron Range Photoresist Imaging: A Practical Approach

David J. Elliott, Mary Ann Hockey

Proceedings Volume 0135, Developments in Semiconductor Microlithography III; (1978) https://doi.org/10.1117/12.956123
Event: Developments in Semiconductor Microlithography III, 1978, San Jose, United States

Abstract

Submicron photoresist imaging technology is discussed in terms of its use in the production of semicon-ductor devices. Photoresist processing techniques necessary for one micron work are reviewed, and optimization techniques presented. Recent developments in semiconductor technology that contribute to sub-micron photolithography are covered, and all major process fabrication steps are reviewed. SEM's showing one micron range images in positive photoresist, along with parameters used to generate them, are presented. Finally, recommendations are made for establishing a one micron range photoresist imaging process.

Citation Download Citation

David J. Elliott and Mary Ann Hockey "One Micron Range Photoresist Imaging: A Practical Approach", Proc. SPIE 0135, Developments in Semiconductor Microlithography III, (6 September 1978); https://doi.org/10.1117/12.956123

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