The optical damage threshold of 3D nanolithography produced microstructures under intense femtosecond irradiation

Linas Jonušauskas; Laurynas Čekanavičius; Gabrielius Rimšelis; Darius Gailevičius; Mangirdas Malinauskas

doi:10.1117/12.2290155

22 February 2018 The optical damage threshold of 3D nanolithography produced microstructures under intense femtosecond irradiation

Linas Jonušauskas, Laurynas Čekanavičius, Gabrielius Rimšelis, Darius Gailevičius, Mangirdas Malinauskas

Author Affiliations +

Proceedings Volume 10544, Advanced Fabrication Technologies for Micro/Nano Optics and Photonics XI; 1054417 (2018) https://doi.org/10.1117/12.2290155
Event: SPIE OPTO, 2018, San Francisco, California, United States

Abstract

This work is dedicated for statistical investigation of laser induced damage threshold of a 3D fs laser lithography produced objects. Arrays of identical polymeric structures are produced out of different materials common in 3D printing and lithography and subjected to varying laser fluence resulting in polymeric objects either being damaged or not. Then, according to the damage probability, linear approximation is used to determine laser induced damage threshold in such structures. This way it is determined, that non photosensitized hybrid organicinorganic zirconium containing SZ2080 is the most resilient material in comparison to photosensitized SZ2080, other hybrid photopolymer OrmoClear, popular in lithography SU8 and Ember Clear used in 3D printing. Acquired results are compared to those obtained by other measurement techniques, advantages and drawbacks of such investigation are discussed.

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Linas Jonušauskas, Laurynas Čekanavičius, Gabrielius Rimšelis, Darius Gailevičius, and Mangirdas Malinauskas "The optical damage threshold of 3D nanolithography produced microstructures under intense femtosecond irradiation", Proc. SPIE 10544, Advanced Fabrication Technologies for Micro/Nano Optics and Photonics XI, 1054417 (22 February 2018); https://doi.org/10.1117/12.2290155

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