Enhancement of optical resistance in high reflectivity mirrors using sculptured thin films

Tomas Tolenis; Lina Grinevičiūtė; Simonas Kičas; Rytis Buzelis

doi:10.1117/12.2313393

5 June 2018 Enhancement of optical resistance in high reflectivity mirrors using sculptured thin films

Tomas Tolenis, Lina Grinevičiūtė, Simonas Kičas, Rytis Buzelis

Proceedings Volume 10691, Advances in Optical Thin Films VI; 106911V (2018) https://doi.org/10.1117/12.2313393
Event: SPIE Optical Systems Design, 2018, Frankfurt, Germany

Abstract

Standard high reflectivity mirrors consist of layers with high and low refractive indexes. Typically, optical resistivity of such elements is limited by the threshold value of material with high index. Combination of two deposition methods, namely ion-beam sputtering and glancing angle deposition, was used to form high reflectivity mirrors for the wavelength of 355 nm. Variation of the design for standard coating and the number of top layers, deposited at oblique angle have been investigated. Laser induced damage thresholds, surface roughness, spectral performance etc. were tested for all the experimental samples. Analysis indicate that combination of both deposition methods allows to enhance the optical resistivity of typical high reflictivity mirrors. Fully sculptured thin film based mirrors also exhibit spectral instability and optical losses. Introducing standard method allows to stabilize the spectra and reduce the losses of total optical component.

Citation Download Citation

Tomas Tolenis, Lina Grinevičiūtė, Simonas Kičas, and Rytis Buzelis "Enhancement of optical resistance in high reflectivity mirrors using sculptured thin films", Proc. SPIE 10691, Advances in Optical Thin Films VI, 106911V (5 June 2018); https://doi.org/10.1117/12.2313393

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