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2 November 2018 A split algorithm of manufacturing stencil mask and dividing pattern for making holographic optical elements (Withdrawal Notice)
Yuta Aoki, Kunio Sakamoto
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Proceedings Volume 10818, Holography, Diffractive Optics, and Applications VIII; 108181E (2018) https://doi.org/10.1117/12.2327054
Event: SPIE/COS Photonics Asia, 2018, Beijing, China
Abstract
Publisher’s Note: This manuscript, originally published on 2 November 2018, has been withdrawn by the publisher for editorial reasons.
© (2018) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
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Yuta Aoki and Kunio Sakamoto "A split algorithm of manufacturing stencil mask and dividing pattern for making holographic optical elements (Withdrawal Notice)", Proc. SPIE 10818, Holography, Diffractive Optics, and Applications VIII, 108181E (2 November 2018); https://doi.org/10.1117/12.2327054
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KEYWORDS
Holograms
3D image reconstruction
Holography
Holographic optical elements
Bridges
Holographic materials
Photomasks
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