X-ray Chemical Reactions of Novolac Diazonaphthoquinone Resists

Derrick C. Mancini; Monroe Sullivan; James W. Taylor; Richard Bormett; T. V. Jayaraman; Richard J. West

doi:10.1117/12.953051

30 January 1989 X-ray Chemical Reactions of Novolac Diazonaphthoquinone Resists

Derrick C. Mancini, Monroe Sullivan, James W. Taylor, Richard Bormett, T. V. Jayaraman, Richard J. West

Proceedings Volume 1086, Advances in Resist Technology and Processing VI; (1989) https://doi.org/10.1117/12.953051
Event: 1989 Santa Clara Symposium on Microlithography, 1989, San Jose, CA, United States

Abstract

Model cresol novolac resins and photoactive compounds (PAC) based on polyhydroxybenzophenones were prepared according to known procedures. The components and resists formulated from them were exposed to X-rays from Aladdin, the electron storage ring at the University of Wisconsin. The loss of azide functionality and the conversion of PAC to acid or ester was monitored by FTIR difference spectrometry. The energy dependence of the sensitivity of conversion of diazonaphthoquinone to ketene was followed by monitoring the loss of diazide when exposed to synchrotron radiation. The effect of PAC functionality on the sensitivity and chemical pathways was studied. The relationship of structure and photon energy to lithographic performance are explored. We discuss the applicability of synchrotron radiation as an exposure source and FTIR as an analytical tool for the study of X-ray resist mechanisms.

Citation Download Citation

Derrick C. Mancini, Monroe Sullivan, James W. Taylor, Richard Bormett, T. V. Jayaraman, and Richard J. West "X-ray Chemical Reactions of Novolac Diazonaphthoquinone Resists", Proc. SPIE 1086, Advances in Resist Technology and Processing VI, (30 January 1989); https://doi.org/10.1117/12.953051

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