Paper
8 July 2019 Study on thermal effect and thermal stress effect of multilayer thin films induced by pulsed laser
Author Affiliations +
Proceedings Volume 11063, Pacific Rim Laser Damage 2019: Optical Materials for High-Power Lasers; 110630J (2019) https://doi.org/10.1117/12.2539212
Event: Pacific Rim Laser Damage 2019 and Thin Film Physics and Applications 2019, 2019, Qingdao, China
Abstract
In order to improve the laser-induced damage threshold (LIDT) of thin film optical elements in laser systems, the thermal damage and thermal stress damage processes in thin films induced by laser are analyzed. Based on the theoretical knowledge of heat conduction, material mechanics and thermoelasticity, the mathematical model of multilayer optical thin films irradiated by single-pulse Gauss laser is established. The active heat conduction equations and thermoelastic equilibrium differential equations under the model are established. The analytical solutions of temperature and thermal stress in multilayer optical thin films induced by laser are derived and calculated. Through software calculation and simulation, the distributions of temperature field and thermal stress field are obtained. By discussing and analyzing the simulation results, the influencing factors and distribution rules of temperature rise and thermal stress are obtained, which provide theoretical basis for preparing thin films with high laser-induced damage threshold.
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Qiankun Cao and Junhong Su "Study on thermal effect and thermal stress effect of multilayer thin films induced by pulsed laser", Proc. SPIE 11063, Pacific Rim Laser Damage 2019: Optical Materials for High-Power Lasers, 110630J (8 July 2019); https://doi.org/10.1117/12.2539212
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KEYWORDS
Thin films

Laser energy

Multilayers

Thermal effects

Pulsed laser operation

Thermography

Interfaces

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