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8 July 2019 Fast measurement technique for obtaining the low damage threshold defects in a large aperture fused silica glass
Shenghao Wang, Lingqiao Li, Zhan Sui, Jianda Shao, Shijie Liu, Zhouling Wu, Jian Chen, Ming Huang
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Proceedings Volume 11063, Pacific Rim Laser Damage 2019: Optical Materials for High-Power Lasers; 110630Y (2019) https://doi.org/10.1117/12.2539370
Event: Pacific Rim Laser Damage 2019 and Thin Film Physics and Applications 2019, 2019, Qingdao, China
Abstract
Measurement of the low damage threshold defects in a large aperture fused silica glass is of great significance. Currently, the popular characterization method for detecting the low damage threshold defects is via measuring the optical absorption of a fused silica glass using the surface thermal lensing technology. However the detecting area of a single shot in this method is too small, typically around 10×10 microns, so if a large aperture fused silica glass in the size of 400×400 mm is to be measured, it would take approximate 100000 hours to complete the measurement, which is obviously not acceptable. Here, we report a fast measurement technique for obtaining the low damage threshold defects in a large aperture fused silica glass according to its fingerprint spectrum, for the fused silica optical glass in the size of 400×400 mm, measurement of the low damage threshold defects in the whole surface in several hours is achievable.
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Shenghao Wang, Lingqiao Li, Zhan Sui, Jianda Shao, Shijie Liu, Zhouling Wu, Jian Chen, and Ming Huang "Fast measurement technique for obtaining the low damage threshold defects in a large aperture fused silica glass", Proc. SPIE 11063, Pacific Rim Laser Damage 2019: Optical Materials for High-Power Lasers, 110630Y (8 July 2019); https://doi.org/10.1117/12.2539370
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KEYWORDS
Laser damage threshold
Fused quartz
Defect detection
Spectrum analysis
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